한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)

한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
권호 표지

광소자 응용을 위한 UV-LIGA 공정 기반의 MEMS 소자 제작

Fabrication of high aspect ratio metallic structures for optical devices using UV-LIGA Process

  • 강호관 (한국과학기술연구원 마이크로시스템센터) ;
  • 채경수 (한국과학기술연구원 마이크로시스템센터) ;
  • 문성욱 (한국과학기술연구원 마이크로시스템센터) ;
  • 오명환 (단국대학교 전기전자 컴퓨터 공학부)
  • 발행 : 2002.07.08
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초록

This paper presents metal structure that is fabricated using UV-LIGA process with PMER N-CA3000. In order to fabricate metal structure with high aspect ratio, the systematic optimization method was adopted and then the structure of $36{\mu}m$ thick mold with aspect ratio 7:1 (trench) and $32{\mu}m$ thick nickel structure was obtained. This structure is applied to the fabrication of optical switch.

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