한국정보통신학회:학술대회논문집 (Proceedings of the Korean Institute of Information and Commucation Sciences Conference)
- 한국해양정보통신학회 2002년도 추계종합학술대회
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- Pages.143-147
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- 2002
RF/DC Magnetron Sputtering을 이용한 Acoustic Bragg Reflector 최적 증착조건에 관한 연구
A Study on the Deposition Condition of Acoustic Bragg Reflector Using RF/DC Magnetron Sputtering
초록
본 논문에서는 FBAR소자에서 중요한 역할을 하는 Reflector의 최적 증착조건을 RF/DC마그네트론 스퍼터링을 이용하여 조사하였다. Reflector를 구성하는 SiO
In this paper, we investigated the deposition condition of Bragg reflector formation that will be expected to play an important role in future FBAR device applications. The thin films were deposited using an RF/DC magnetron sputtering technique. The material characteristics such as deposition rates, grain structures and surface roughnesses of the deposited silicon dioxide (SiO
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