Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2002.07c
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- Pages.1612-1614
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- 2002
Lateral Diffusion of Boron Ions Implanted in The Amorphous Si Film On Silicon Oxide Film During Excimer Laser Irradiation
비정질 실리콘 박막에서 엑시머 레이저에 의한 붕소이온의 수평확산
- Park, Soo-Jeong (School of Electrical Engineering (#50), Seoul National University) ;
- Lee, Min-Cheol (School of Electrical Engineering (#50), Seoul National University) ;
- Kang, Su-Hyuk (School of Electrical Engineering (#50), Seoul National University) ;
- Han, Min-Koo (School of Electrical Engineering (#50), Seoul National University)
- Published : 2002.07.10
Abstract
본 논문에서는 엑시머 레이저 조사에 의한 이온 농도의 분포 변화를 알아보기 위해 붕소 이온이 선택적으로 주입된 비정질 실리콘 박막 위에 XeCl (
Keywords