러빙 처리된 표면의 적층 절연막을 가지는 Pentacene TFT의 전기적 특성

ELECTRICAL CHARACTERISTICS OF PENTACENE THIN FILM TRANSISTORS WITH STACKED AND SURFACE-TREATED GATE INSULATORS

  • 강창헌 (홍익대학교 전기제어공학과) ;
  • 이종혁 (홍익대학교 전기제어공학과) ;
  • 박재훈 (홍익대학교 전기제어공학과) ;
  • 최종선 (홍익대학교 전기제어공학과)
  • 발행 : 2002.07.10

초록

In this paper, the electrical characteristics of pentacene thin film transistors(TFTs) with stacked and surface-treated gate insulators have been investigated. The semiconductor layer of pentacene was thermally evaporated onto the stacked gate insulators. For the gate insulating materials. PVP(PolyvinylPhenol) and polystyrene were spin-coated with two different stacking orders, PVP-polystyrene and polystyrene-PVP. Rapid solvent evaporation during the spin-coating processes of these insulating layers produces non-equilibrium phase morphologies accompanied by surface undulations on gate insulator interfaces. This non-equilibrium phase morphology affects the growth mode of the subsequent pentacene layer. Therefore, in order to smoothen the gate dielectric surfaces, gate dielectric surfaces were rubbed laterally along the direction from the drain to the source TFTs with with stacked and surface-treated gate insulators have provided improved operational characteristics.

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