대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 2002년도 하계학술대회 논문집 C
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- Pages.1482-1484
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- 2002
후 식각법을 이용한 Textured ZnO:Al 투명전도막 제조
The fabrication of textured ZnO:Al films using HCI wet chemical etching
- 유진수 (한국에너지기술연구원 태양광발전연구팀) ;
- 이정철 (한국에너지기술연구원 태양광발전연구팀) ;
- 강기환 (한국에너지기술연구원 태양광발전연구팀) ;
- 김석기 (한국에너지기술연구원 태양광발전연구팀) ;
- 윤경훈 (한국에너지기술연구원 태양광발전연구팀) ;
- 송진수 (한국에너지기술연구원 태양광발전연구팀) ;
- 박이준 (한국에너지기술연구원 태양광발전연구팀)
- Yoo, Jin-Su (Photovoltaic Research Team, Korea Institute of Energy Research) ;
- Lee, Jeong-Chul (Photovoltaic Research Team, Korea Institute of Energy Research) ;
- Kang, Ki-Hwan (Photovoltaic Research Team, Korea Institute of Energy Research) ;
- Kim, Seok-Ki (Photovoltaic Research Team, Korea Institute of Energy Research) ;
- Yoon, Kyung-Hoon (Photovoltaic Research Team, Korea Institute of Energy Research) ;
- Song, Jin-Soo (Photovoltaic Research Team, Korea Institute of Energy Research) ;
- Park, I-Jun (Photovoltaic Research Team, Korea Institute of Energy Research)
- 발행 : 2002.07.10
초록
Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures
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