Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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The fabrication of textured ZnO:Al films using HCI wet chemical etching

후 식각법을 이용한 Textured ZnO:Al 투명전도막 제조

  • Yoo, Jin-Su (Photovoltaic Research Team, Korea Institute of Energy Research) ;
  • Lee, Jeong-Chul (Photovoltaic Research Team, Korea Institute of Energy Research) ;
  • Kang, Ki-Hwan (Photovoltaic Research Team, Korea Institute of Energy Research) ;
  • Kim, Seok-Ki (Photovoltaic Research Team, Korea Institute of Energy Research) ;
  • Yoon, Kyung-Hoon (Photovoltaic Research Team, Korea Institute of Energy Research) ;
  • Song, Jin-Soo (Photovoltaic Research Team, Korea Institute of Energy Research) ;
  • Park, I-Jun (Photovoltaic Research Team, Korea Institute of Energy Research)
  • 유진수 (한국에너지기술연구원 태양광발전연구팀) ;
  • 이정철 (한국에너지기술연구원 태양광발전연구팀) ;
  • 강기환 (한국에너지기술연구원 태양광발전연구팀) ;
  • 김석기 (한국에너지기술연구원 태양광발전연구팀) ;
  • 윤경훈 (한국에너지기술연구원 태양광발전연구팀) ;
  • 송진수 (한국에너지기술연구원 태양광발전연구팀) ;
  • 박이준 (한국에너지기술연구원 태양광발전연구팀)
  • Published : 2002.07.10
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Abstract

Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures $({\leq}300^{\circ}C)$, the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

Keywords