Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2001.07a
- /
- Pages.71-71
- /
- 2001
A study of MOS ehayaeteristics of reoxidized $HfO_2$ thin film for gate oxide applications
- Lee, Dong-Won (Department of Ceramic Engineering, Yonsei University) ;
- Choi, Hyo-Jick (Department of Ceramic Engineering, Yonsei University) ;
- Nam, Seok-Woo (Department of Ceramic Engineering, Yonsei University, R&D Center Semiconductor Samsung Electronics Co.) ;
- Nam, Su-Heun (Department of Ceramic Engineering, Yonsei University) ;
- Ko, Dae-Hong (Department of Ceramic Engineering, Yonsei University)
- Published : 2001.07.05
Abstract
Keywords