The changes of chemical bonding of nitrogen with varying the oxygen incorporation within the indium oxy-nitride then films.

Yi, Yeon-Jin (Institute of physics and applied physics and Atomic scale surface science research center, Yonsei University) ;
Roh, Y.S. (Institute of physics and applied physics and Atomic scale surface science research center, Yonsei University) ;
Chung, Yong-Duck (Institute of physics and applied physics and Atomic scale surface science research center, Yonsei University) ;
Kim, Shin-Cheul (Institute of physics and applied physics and Atomic scale surface science research center, Yonsei University) ;
Shin, Hyun-Joon (Beamline Research Division, Pohang Accelerator Laboratory, Pohang University of Science and Technology) ;
Jeong, Kwang-Ho (Institute of physics and applied physics and Atomic scale surface science research center, Yonsei University)