한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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- Pages.209-212
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- 2001
$CF_4$ 첨가에 따른 polyimide 박막의 패터닝 연구
The Patterning of Polyimide Thin Films for the Additive $CF_4$ gas
- 발행 : 2001.11.08
초록
Polyimide(PI) films have been considered as the interlayer dielectric materials due to low dielectric constant, low water absorption, high gap-fill and planarization capability. The PI mm Was etched with using inductively coupled plasma (ICP). The etching characteristics such as etch rate and selectivity were evaluated to gas mixing ratio. High etch rate was