Fabricated Tunable Capacitor of Air-gap Variations Using Cu Electroplating

구리 전해도금을 이용한 Air-gap 변화 방식의 Tunable capacitor 제조

  • Lee, Jae-Ho (School of Electronics and Engineering Kyungpook National University) ;
  • Seo, Chang-Taeg (School of Electronics and Engineering Kyungpook National University) ;
  • Lee, Myoung-Bok (School of Electronics and Engineering Kyungpook National University) ;
  • Lee, Jong-Hyun (School of Electronics and Engineering Kyungpook National University)
  • Published : 2001.11.03

Abstract

In this paper, we present the fabrication and performance of tunable capacitors with various structural geometry of plates. Experimental devices have been fabricated using Cu-electroplating techniques and standard MEMS techniques. In particular, the thickness of electroplated Cu is designed below $0.5{\mu}m$ for lower actuation voltage. The fabricated tunable capacitors has been tested from $OV{\sim}42V$ and achieves a tuning ratio of $46%{\sim}64.2%$.

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