Nanotribological Characterization of Fluorocarbon Thin Film by Plasma Enhanced CVD

  • Kim, Tae-Gon (Metallurgy and Materials Engineering, Hanyang Univ.) ;
  • Lee, Su-Youn (Metallurgy and Materials Engineering, Hanyang Univ.) ;
  • Park, Jin-Goo (Metallurgy and Materials Engineering, Hanyang Univ.) ;
  • Shin, Hyung-Jae (Core Technology Research Center, Samsung electronics Co. Ltd.)
  • Published : 2001.07.01