Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 2001.07c
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- Pages.1475-1477
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- 2001
A Study on the c-axis preferred orientation of CoCr(-Ta)/Si doublelayer
CoCr(-Ta)/Si 이층막의 c-축 우선 배향성에 관한 연구
- Kim, Y.J. (Kyungwon Univ.) ;
- Park, W.H. (Kyungwon Univ.) ;
- Kwon, S.K. (Donghae Univ.) ;
- Son, I.H. (Shinsung College) ;
- Choi, H.W. (Kyungwon Univ.) ;
- Kim, K.H. (Kyungwon Univ.)
- 김용진 (경원대학교 전기정보공학과) ;
- 박원효 (경원대학교 전기정보공학과) ;
- 신성권 (동해대학교 정보통신공학과) ;
- 손인환 (신성대학 전기과) ;
- 최형욱 (경원대학교 전기정보공학과) ;
- 김경환 (경원대학교 전기정보공학과)
- Published : 2001.07.18
Abstract
In odor to set high saturation magnetization and coercivity, it had need to orient axis of easy magnetization of CoCr-based thin film perpendicular direction(c-axis) to the substrate plane. It was known that crystalline orientation of CoCr-based thin film was improved by introducing underlayer like Ti, Ge. We prepared singlelayer and double layer with Si underlayer by Facing Targets Sputtering System. As a result, intensity and c-axis dispersion angle
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