Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Characteristics of the diffraction grating formation for SeGe

SeGe 재료의 회절 격자 형성 특성

  • 박정일 (광운대학교 전자재료공학과) ;
  • 박종화 (광운대학교 전자재료공학과) ;
  • 김진우 (광운대학교 전자재료공학과) ;
  • 여철호 (광운대학교 전자재료공학과) ;
  • 이영종 (여주대학 전자과) ;
  • 정홍배 (광운대학교 전자재료공학과)
  • Published : 2001.07.18
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Abstract

We have investigated about the grating formation of the $a-Se_{75}-Ge_{25}$ chalcogenide thin films. In this study, holographic gratings have been formed by using He-Ne laser(632.8nm) with different polarization states(linear, circular polarization). The diffraction efficiency was obtained by +1st order intensity of the diffracted beam. We have obtained maximum efficiency for Ag-doped thin film. It is observed the difference of the diffraction efficiency with polarization states. S:S-polarized state is shown high efficiency than the other polarization.

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