구조적 변화에 따른 GaAs MESFET 제작 및 DC 특성

DC Characteristices of GaAs MESFET with Different Physical Structures

The less sensitive structure to the surface effect has been presented utiliting an undoped GaAs layer on the n-GaAs channel. The undoped layer has been found to be effective to supress the frequency dispersion phenomena caused by a surface trapping effect and to raise the MESFET's performance. The gate structure, with an undoped layer underneath the gate metal has been found to be effective to improve the breakdown voltage. GaAs MESFETS with different physical structures are fabricated and DC characteristics are measued. GaAs MESFET's are fabricated on epi-wafers which have an undoped GaAs layer in between n+ and n GaAs layers grown by MBE.