Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1999.11d
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- Pages.1160-1163
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- 1999
A Study on the Nano-Lithography using FE-tip
FE-tip을 이용한 Nano-Lithography 기술에 관한 연구
- Choi, Je-Hyuk (School of Electrical Engineering) ;
- Park, Sun-Woo (School of Electrical Engineering) ;
- Kim, Chul-Ju (School of Electrical Engineering)
- Published : 1999.11.20
Abstract
In this study, we developed FE-tip lithography system that could apply to multi-tip system and did lithography using FE-tip. The software that control FE-tip lithography system, was proposed for acquiring more adaptive data to compensate the effect of fluctuation. We found that the fluctuation effect was reduced. The minimum line width was related to applied voltage and we observed a movement of Z-axis piezo stage to correct the error of this system. When FE current was 5nA, scanning speed was
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