Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)
- 1999.11a
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- Pages.883-886
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- 1999
Characterizations of tungsten thin-film grown by LPCVD on SiO$_2$
LPCVD 방식으로 SiO$_2$ 위에 증착된 텅스텐 박막의 특성 분석
Abstract
We deposited tungsten gate electrode on gate SiO
Keywords