Growth of carbon nanotubes on a large area of Si substrate by the thermal chemical vapor deposition

열화학기상증착법에 의한 대면적 실리콘 기판위에서의 탄소나노튜브 성장

  • 김대운 (군산대학교 전기공학과) ;
  • 이철진 (군산대학교 전기공학과) ;
  • 이태재 (군산대학교 전기공학과) ;
  • 박정훈 (군산대학교 전기공학과) ;
  • 손권희 (군산대학교 전기공학과) ;
  • 강현근 (군산대학교 전기공학과) ;
  • 송홍기 (군산대학교 전기공학과) ;
  • 최영철 (전북대학교 물리학과, 반도체과학기술대학원) ;
  • 박영수 (전북대학교 물리학과, 반도체과학기술대학원)
  • Published : 1999.06.01

Abstract

We have synthesized carbon nanotubes by thermal chemical vapor deposition of $C_2$H$_2$ on transition metal-coated silicon substrates. Carbon nanotubes are uniformly synthesized on a large area of the plain Si substrates, different from previously reported porous Si substrates. It is observed that surface modification of transition metals deposited on substrates by either etching with dipping in a HF solution and/or NH$_3$ pretreatment is a crucial step for the nanotube growth prior to the reaction of $C_2$H$_2$gas. We will demonstrate that the diameters of carbon naotubes can be controlled by applying the different transition metals.

Keywords