후막형 전류제한소자제작과 전류제한특성 연구

The study on characterization of current limit and fabrication of device for current limit formed by thick film

  • 임성훈 (전북대학교 전기공학과) ;
  • 강형곤 (전북대학교 전기공학과) ;
  • 최명호 (전북대학교 전기공학과) ;
  • 한병성 (전북대학교 전기공학과)
  • Lim, Sung-Hun (Chonbuk National University Dept. of Electrical Engineering) ;
  • Kang, Hyeong-Gon (Chonbuk National University Dept. of Electrical Engineering) ;
  • Choi, Myung-Ho (Chonbuk National University Dept. of Electrical Engineering) ;
  • Han, Byung-Sung (Chonbuk National University Dept. of Electrical Engineering)
  • 발행 : 1999.07.19

초록

$YBa_2Cu_3O_x$ superconducting thick film was fabricated by surface diffusion process of $Y_2BaCUO_5$ and the mixed compound of $(3BaCuO_2+2CuO)$ expected to be liquid phase above the peritectic temperature of YBa2Cu30x. For the surface diffusion. 3BaCu02+2CuO mixed with binder material was patterned on $Y_2BaCuO_5$ substrate by the screen printing method. The characteristic of current limit on thick film fabricated was measured. The thick film limited the current from $2.8213mA_{rms}$ to $4.2034mA_{rms}$ with $500{\Omega}$ load resistance, and from $4.1831mA{rms}$ to $4.2150mA_{rms}$ with $10{\Omega}$ load resistance.

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