Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1999.07e
- /
- Pages.2236-2238
- /
- 1999
A Study on the Glow Discharge Characteristics of MgO thin film prepared by Unbalanced Magnetron Sputtering
불평형 마그네트론 스파터링에 의해 형성된 MgO 박막의 글로우 방전특성에 관한 연구
- Kim, Young-Kee (Dept. of Electrical Engineering, Pusan National University) ;
- Park, Jung-Tae (Dept. of Electrical Engineering, Pusan National University) ;
- Ko, Kwang-Sic (Dept. of Electrical Engineering, Pusan National University) ;
-
Kim, Gyu-Seup
;
-
Park, Chung-Hoo
(Dept. of Electrical Engineering, Pusan National University)
;
-
Cho, Jung-Soo
(Dept. of Electrical Engineering, Pusan National University)
- 김영기 (부산대학교 전기공학과) ;
- 박정태 (부산대학교 전기공학과) ;
- 고광식 (부산대학교 전기공학과) ;
-
김규섭
(동명대학 전기과)
;
-
박정후
(부산대학교 전기공학과)
;
-
조정수
(부산대학교 전기공학과)
- Published : 1999.07.19
Abstract
This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by RF unbalanced magnetron sputtering(UBMS) in surface discharge type AC PDP. The minimum discharge voltage is obtained for the sample of substrate holder bias voltage -10V. The main factors that improves the discharge characteristics by applied bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process Moreover, the anti-sputtering characteristics of MgO thin film by UBMS is more excellent than that of balanced magnetron sputtering(BMS) and E-beam evaporation method.
Keywords