MULTILAYERED TANTALUM-ALUMINIUM OXIDE FILMS GROWN BY ATOMIC LAYER DEPOSITION

  • Kim, Yong-S. (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Kang, J.S. (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Yun, S.J. (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Park, M.C. (Semiconductor Technology Division, Electronics and Telecommunications Research Institute) ;
  • Nam, K.S. (Semiconductor Technology Division, Electronics and Telecommunications Research Institute)
  • Published : 1998.08.01