ELECTROMIGRATION STUDY OF Al THIN FILMS DEPOSITED ON LOW DIELECTRIC POLYIMIDE AND $SiO_2$ ILD

  • Eun, B.S. (Dept. of Mat. Eng., Hanyang Univ.) ;
  • Kim, Y.H. (Dept. of Mat. Eng., Hanyang Univ.)
  • Published : 1998.08.01