대한전기학회:학술대회논문집 (Proceedings of the KIEE Conference)
- 대한전기학회 1998년도 하계학술대회 논문집 D
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- Pages.1294-1296
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- 1998
ICP를 이용한 Ar/HBr/$Cl_2$ 가스에서 백금 박막의 식각 연구
A Study on Etching of Platinum Thin Film in ICP Using Ar/HBr/$Cl_2$ Gases
- Kim, Nam-Hoon (Dept. of Electrical Engineering, Chung-Ang Univ.) ;
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Kim, Chang-Il
(Dept. of Electrical Engineering, Chung-Ang Univ.) ;
- Kwon, Kwang-Ho (Dept. of Electronic Engineering, Han-Seo Univ.) ;
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Chang, Eui-Goo
(Dept. of Electrical Engineering, Chung-Ang Univ.)
- 발행 : 1998.07.20
초록
Platinum thin films which hardly form volatile compounds with any reactive gas at normal process temperature was etched in Inductively Coupled Plasma (ICP) using Ar/HBr/
키워드