Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1998.07e
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- Pages.1761-1763
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- 1998
A Study on the Fabrication of ITO Film by Discharge Plasma
FTS 방식에 의한 ITO Film 제작에 관한 연구
- Ma, H.B. (Dept. of Electrical Eng. Pusan National University) ;
- Ko, J.S. (Dept. of Electrical Eng. Pusan National University) ;
- Son, J.B. (Dept. of Electrical Eng. Pusan National University) ;
- Park, C.S. (Dept. of Electrical Eng. Pusan National University) ;
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Park, C.H.
(Dept. of Electrical Eng. Pusan National University) ;
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Cho, J.S.
(Dept. of Electrical Eng. Pusan National University)
- Published : 1998.07.20
Abstract
ITO(Iridium-Tin Oxide) thin film, as discharge electrodes in AC PDP, should have low resistivity and high transparency. Regarded as a high deposition rate method, the ITO thin film fabricated by the facing target sputtering system has been studied in this paper. The electrical property of the ITO film deposited below
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