초록
In this paper, we present an $H^{\infty}$ controller design of RTP system satisfying robust stability and performance using weighted mixed sensitivity minimization. In industrial fields, RTP system is widely used for improving the oxidation and the annealing in semiconductor manufacturing process. The main control factors are temperature control of wafer and uniformity in the wafer. The control of temperature and uniformity has been solved by PI control method. We improve robust stability and performance of RTP system by the design of $H^{\infty}$ controller using the weighted mixed sensivity function. An example is proposed to show the validity of proposed method.d.
