Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1997.07d
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- Pages.1280-1282
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- 1997
A study on the electrical properties by the effect of wafer cleaning of OXYNITRIDE films deposited by Laser CVD
레이저 CVD법에 의해 퇴적된 OXYNITRIDE막의 기판세정법에 따른 특성에 관한 연구
- Kim, C.D. (Dept. of Electrical Engineering, Korea Univ.) ;
- Lee, S.K. (Dept. of Electrical Engineering, Korea Univ.) ;
- Kim, T.H. (Dept. of Electrical Engineering, Korea Univ.) ;
- Sung, Y.K. (Dept. of Electrical Engineering, Korea Univ.)
- Published : 1997.07.21
Abstract
The oxynitride films were photo-chemically deposited by ArF(wave length: 193nm) excimer laser CVD used to excite and dissociate gas phases
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