한국정밀공학회:학술대회논문집 (Proceedings of the Korean Society of Precision Engineering Conference)
- 한국정밀공학회 1996년도 추계학술대회 논문집
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- Pages.725-730
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- 1996
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- 2005-8446(pISSN)
HF 기상식각에 의한 TEOS 희생층의 표면 미세가공
Surface Micromachining of TEOS Sacrificial Layers by HF Gas Phase Etching
초록
The key process in silicon surface micromachining is the selective etching of a sacrificial layer to release the silicon microstructure. The newly developed anhydrous HF/
키워드