SOI BMFET 의 고온 특성 분석

High Temperature Characteristics of SOI BMFET

  • 임무섭 (서울대학교 전기공학부) ;
  • 김성동 (서울대학교 전기공학부) ;
  • 한민구 (서울대학교 전기공학부) ;
  • 최연익 (아주대학교 전기전자공학부)
  • 발행 : 1996.07.22

초록

The high temperature characteristics of SOI BMFET are analyzed by the numerical simulation and compared with MOS-gated SOI power devices at high temperatures. The proposed SOI BMFET combines bipolar operation in the on-state with unipolar FET operation in the off-state, so that it may be suitable for high temperature operation without any significant degradation of performance such as the leakage current and blocking capability. The simulation results show that SOI BMFET with a higher doped n-resurf layer is the most promising device far high temperature application as compared with MOS-gated SOI power devices, exhibiting the low on-state voltage drop as well as the excellent forward blocking capability at high temperature.

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