3극 마그네트론 스퍼트링 화학 기상 증착법에 의한 도전성 다이아몬드성 탄소 박막의 합성

Synthesis of Conducting Diamond-Like Carbon Films by TRIODE Magnetron Sputtering-Chemical Vapor Deposition

  • Lee, Jong-Yul (Dept. of Electrical Engineering, Seoul National University) ;
  • Tae, Heung-Sik (Dept. of Electrical Engineering, Seoul National University) ;
  • Pyo, Jae-Hwack (Dept. of Electrical Engineering, Seoul National University) ;
  • Whang, Ki-Woong (Dept. of Electrical Engineering, Seoul National University)
  • 발행 : 1994.11.18

초록

We synthesized the conducting diamond-like carbon films using plasma-enhanced chemical vapor deposition and analysized its characteristics. We obtained the metal-containing diamond-like carbon films using $CH_4$, Ar gas and aluminum target. We observed the changes of electrical conductivity, microhardness and surface morphology according to $Ar/CH_4$ ratio, substrate bias and target bias. As the target bias and $Ar/CH_4$ ratio increase and the substrate bias decreases, the electrical conductivity and surface roughness increase. The increase of hardness involves decrease of the electrical conductivity. Metal-containing amorphous hydrogenated carbon films show improved adhesion on metal substrates compared to pure diamond-like carbon films and better electrical conductivity.

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