Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)
- 1988.07a
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- Pages.319-323
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- 1988
Effects of native oxide on Si substrates-As ion implanted on the formation of Ti-Silicides grown by RTP method
As Ion 주입된 Si 기판위의 native oxide가 RTP법으로 성장시킨 Ti-Silicides의 형성에 미치는 영향
- Chung, Ju-Hyuck (Dept. of Materials Eng. Hanyang Univ.) ;
- Choi, Jin-Seog (Dept. of Materials Eng. Hanyang Univ.) ;
- Paek, Su-Hyon (Dept. of Materials Eng. Hanyang Univ.)
- Published : 1988.07.01
Abstract
For finding the effects of As on
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