• Title/Summary/Keyword: yield line

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Effect of Galvanizing Furnace Temperature on Material Property and Galvanized Surface of Hot Rolled Galvanized Steel

  • Jong Chan Jeong;Jae Joong Kim;Seong Ho Han
    • Corrosion Science and Technology
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    • v.23 no.4
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    • pp.278-282
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    • 2024
  • Recently, hot rolled galvanized steel is widely used in automotive parts. As the paradigm of the automotive market has changed from fossil fuel vehicle to electric vehicle, the automotive industry needs more high-strength steels to reduce weights of automobiles. However, because high-strength steel contains high solute carbon, it is expected to have a risk of stretcher-strain on the surface due to dislocation trapping by solute [C] and [N]. Generally, galvanized steel is supposed to pass through a furnace around the temperature of Zinc pot to increase material temperature. Otherwise, the inhibition layer could not be formed. However, solute carbon and nitrogen are volatile enough to move around the furnace temperature. Moreover, the ratio of ferrite phase and precipitated Fe3C can be variable, resulting in yield point elongation related to the stretcher strain. Furthermore, the quality of the galvanized surface can be affected by a high temperature of the furnace. Although a relatively hot rolled galvanizing line furnace has a lower temperature than an annealing line furnace, it can affect various quality aspects. In other words, this paper aims to determine how these phenomena appear concerning furnace temperature.

A Study on Deterministic Utilization of Facilities for Allocation in the Semiconductor Manufacturing (반도체 설비의 효율성 제고를 위한 설비 할당 스케줄링 규칙에 관한 연구)

  • Kim, Jeong Woo
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.39 no.1
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    • pp.153-161
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    • 2016
  • Semiconductor manufacturing has suffered from the complex process behavior of the technology oriented control in the production line. While the technological processes are in charge of the quality and the yield of the product, the operational management is also critical for the productivity of the manufacturing line. The fabrication line in the semiconductor manufacturing is considered as the most complex part because of various kinds of the equipment, re-entrant process routing and various product devices. The efficiency and the productivity of the fabrication line may give a significant impact on the subsequent processes such as the probe line, the assembly line and final test line. In the management of the re-entrant process such as semiconductor fabrication, it is important to keep balanced fabrication line. The Performance measures in the fabrication line are throughput, cycle time, inventory, shortage, etc. In the fabrication, throughput and cycle time are the conflicting performance measures. It is very difficult to achieve two conflicting goal simultaneously in the manufacturing line. The capacity of equipment is important factor in the production planning and scheduling. The production planning consideration of capacity can make the scheduling more realistic. In this paper, an input and scheduling rule are to achieve the balanced operation in semiconductor fabrication line through equipment capacity and workload are proposed and evaluated. New backward projection and scheduling rule consideration of facility capacity are suggested. Scheduling wafers on the appropriate facilities are controlled by available capacity, which are determined by the workload in terms of the meet the production target.

A SDR/DDR 4Gb DRAM with $0.11\mu\textrm{m}$ DRAM Technology

  • Kim, Ki-Nam
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.1 no.1
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    • pp.20-30
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    • 2001
  • A 1.8V $650{\;}\textrm{mm}^2$ 4Gb DRAM having $0.10{\;}\mu\textrm{m}^2$ cell size has been successfully developed using 0.11 $\mu\textrm{m}$DRAM technology. Considering manufactur-ability, we have focused on developing patterning technology using KrF lithography that makes $0.11{\;}\mu\textrm{m}$ DRAM technology possible. Furthermore, we developed novel DRAM technologies, which will have strong influence on the future DRAM integration. These are novel oxide gap-filling, W-bit line with stud contact for borderless metal contact, line-type storage node self-aligned contact (SAC), mechanically stable metal-insulator-silicon (MIS) capacitor and CVD Al process for metal inter-connections. In addition, 80 nm array transistor and sub-80 nm memory cell contact are also developed for high functional yield as well as chip performance. Many issues which large sized chip often faces are solved by novel design approaches such as skew minimizing technique, gain control pre-sensing scheme and bit line calibration scheme.

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Ion Induced Secondary Electron Emission of MgO with Patterned Gold Line Charge Neutralization

  • Lee, Jong-Wan;Lee, Kie-Young;Kim, Hong-Gyu;Ahn, Joon-Hyung;Jung, Won-Joon;Yoon, Sean-J;Byungdu Oh
    • Journal of Korean Vacuum Science & Technology
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    • v.5 no.1
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    • pp.7-10
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    • 2001
  • Ion induced secondary electron emission coefficients γ of protecting layers of an AC plasma display panel(AC-PDP) have been measured. In order to solve the surface charging effect during the measurement at insulating samples like MgO, a new method with the patterned gold line charge neutralization has been introduced. The measurement was performed at the samples, MgO and MgO+MgF$_2$, which showed a great difference in the firing voltage between the two protecting layers. The γ value has been compared with the firing voltage Vf of the AC-PDP with the same protecting layer. Correct relationship between γ and Vf has been observed. Thus, the patterned gold line method has been proven to be successful for the measurement of the secondary electron emission yield at insulator sample surfaces.

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On-Line Estimation of Cell Growth from Agitation Speed in DO-Stat Culture of a Filamentous Microorganism, Agaricus blazei

  • Na, Jeong-Geol;Kim, Hyun-Han;Chang, Yong-Keun
    • Biotechnology and Bioprocess Engineering:BBE
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    • v.10 no.6
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    • pp.571-575
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    • 2005
  • A simple, but effective on-line method for estimating the mycelial cell mass concentration from agitation speed data, a most readily-available process variable, has been developed for DO-stat cultures of Agaricus blazei. The dynamic change of dissolved oxygen concentration (DOC) in the initial transient period and the change in yield were considered in the development of the estimation algorithm or estimator. Parameters in the estimation algorithm were calculated from the agitation speed data at 20% of DOC. The proposed estimator could accurately predict the cell mass concentration regardless of DOC levels in the tested range of $10{\sim}40%$, showing a good extrapolation capability.

Study on the Compositions of Photosensitive Ag Paste for Patterning Embedded Fine-Line Inductor in LTCC (LTCC 내장형 미세 라인 인덕터 구현을 위한 감광성 Ag Paste 조성에 관한 연구)

  • Lee, Sang-Myoung;Park, Seong-Dae;Yoo, Myong-Jae;Lee, Woo-Sung;Kang, Nam-Kee;Nahm, Sahn
    • Journal of the Korean Ceramic Society
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    • v.44 no.3 s.298
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    • pp.157-161
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    • 2007
  • Line width under $100\;{\mu}m$ with good resolution is difficult to achieve using conventional thick-film process utilizing screen printing method. However combined with lithography technology finer line and space for miniaturization and highly integrated package is achievable. In this study, photosensitive Ag paste of optimum formulation used for thick film lithography technology was fabricated by various Ag powder, glass powder and additives. As the result, line width of $30\;{\mu}m$ with good definition and reduced mismatch during co-firing with LTCC substrate was acquired. Formulated Ag paste was used to pattern embedded fine line inductor with over 90% yield.

Achromatic and Athermal Design of a Mobile-phone Camera Lens by Redistributing Optical First-order Quantities

  • Tae-Sik Ryu;Sung-Chan Park
    • Current Optics and Photonics
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    • v.7 no.3
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    • pp.273-282
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    • 2023
  • This paper presents a new method for redistributing effectively the first orders of each lens element to achromatize and athermalize an optical system, by introducing a novel method for adjusting the slope of an achromatic and athermal line. This line is specified by connecting the housing, equivalent single lens, and aberration-corrected point on a glass map composed of available plastic and glass materials for molding. Thus, if a specific lens is replaced with the material characterized by the chromatic and thermal powers of an aberration-corrected point, we obtain an achromatic and athermal system. First, we identify two materials that yield the minimum and maximum slopes of the line from a housing coordinate, which specifies the slope range of the line spanning the available materials on a glass map. Next, redistributing the optical first orders (optical powers and paraxial ray heights) of lens elements by moving the achromatic and athermal line into the available slope range of materials yields a good achromatic and athermal design. Applying this concept to design a mobile-phone camera lens, we efficiently obtain an achromatic and athermal system with cost-effective material selection, over the specified temperature and waveband ranges.

Comparison of Major Agronomic Traits between Barley Near-Isogenic Line for Awnedness (보리까락길이 Near-Isogenic 계통의 주요 형질 비교)

  • 천종은
    • KOREAN JOURNAL OF CROP SCIENCE
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    • v.38 no.2
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    • pp.121-127
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    • 1993
  • The barley plant for whole crop forage is advantageous to have traits with higher photosynthetic rate, biomass, lodging resistance, and awnless spikes. The objective of this study is to investigate performance of near-isogenic line pairs for the awned and awnless in the field, and to observe the variations in photosynthetic rate, yield and their related traits under removal of flag leaf and awns. Grain yield was 6% higher, but biomass and photosynthetic rate were 6~16% and 6% lower in the awned line than those in the awnless grown in the field ,respectively. Defoliation of flag leaf resulted in approximately 3~4%, and 5~6% decreases in 1,000 kernels and grain weights, respectively. Deawning at the heading stage of the long awned line decreased 1,000 kernels and grain weights by 7% and 15%, respectively, The removal of both assimilative tissues caused 14 and 21% decrements in 1,000 kernels and grain weights. Apparent photosynthetic rate of leaf blade in awnless line was 6.1 -9. 7 $CO_2$$_2$ ${\mu}$mole $m^{-2}$ $s{-1}$, much higher than that in awned line. The relative rates in the second and third leaves were about 93% and 55~63%, respectively as compared with that in the flag leaf. The results of the experiments suggest that the awnless line selected for whole crop forage is a potential plant type with higher photosynthetic rate, leaf area and greater biomass.

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Preliminary Culture Evaluation of Newly Introduced Apios (Apios americana M.) (아피오스(Apios americana M.) 도입 생산을 위한 기초 연구)

  • Riu Key Zung;Kang Young Kil;Kang Bong Kyoon;Kim Dong Sub;Park In Sook;Song Hi Sup;Kang Si-Yong
    • Korean Journal of Plant Resources
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    • v.18 no.3
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    • pp.424-432
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    • 2005
  • Newly introduced two lines of apios (Apios americana Medikus, red-vine and green-vine) were grown in Jeju island, to clarify their growth and production characteristics as well as to develope as a new edible crops in Korea. Both lines bloomed but did not develop to pod and seed. The red-viny line showed the habit of more early growth and maturity compared with green-viny line. Fresh tuber yields per 10a harvested in late November ranged from about 500kg to 800kg as according to the lines and cultural condition. Fresh tuber yield of red-viny line was relatively greater than that of green-viny line, mainly due to their higher tuber number per plant. Among the planting dates(April 1, April 16 and May 1) of seed tubes, highest tuber yield was obtained on May 16 planting. And the stacking cultivation culture was better than non-stacking cultivation in respect of tuber yield and disease avoidance. These results indicate that apios can produce in Jeju island, and in order to extend its cultivation to farmers it will be needed to develope some cultivars with high yields as well as labor-saving cultivation methods.

A Study on Welding Deformation of thin plate block in PCTC (PCTC 박판 블록 용접 변형에 관한 연구)

  • Kang, Serng-Ku;Yang, Jong-Su;Kim, Ho-Kyeong
    • Proceedings of the KWS Conference
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    • 2009.11a
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    • pp.97-97
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    • 2009
  • The use of thin plate increases due to the need for light weight in large ship. Thin plate is easily distorted and has residual stress by welding heat. Therefore, the thin plate should be carefully joined to minimize the welding deformation which costs time and money for repair. For one effort to reduce welding deformation, it is very useful to predict welding deformation before welding execution. There are two methods to analyze welding deformation. One is simple linear analysis. The other is nonlinear analysis. The simple linear analysis is elastic analysis using the equivalent load method or inherent strain method from welding experiments. The nonlinear analysis is thermo-elastic analysis which gives consideration to the nonlinearity of material dependent on temperature and time, welding current, voltage, speed, sequence and constraint. In this study, the welding deformation is analyzed by using thermo-elastic method for PCTC(Pure Car and Truck Carrier) which carries cars and trucks. PCTC uses thin plates of 6mm thickness which is susceptible to welding heat. The analysis dimension is 19,200mm(length) * 13,825mm(width) * 376mm(height). MARC and MENTAT are used as pre and post processor and solver. The boundary conditions are based on the real situation in shipyard. The simulations contain convection and gravity. The material of the thin block is mild steel with $235N/mm^2$ yield strength. Its nonlinearity of conductivity, specific heat, Young's modulus and yield strength is applied in simulations. Welding is done in two pass. First pass lasts 2,100 second, then it rests for 900 second, then second pass lasts 2,100 second and then it rests for 20,000 second. The displacement at 0 sec is caused by its own weight. It is maximum 19mm at the free side. The welding line expands, shrinks during welding and finally experiences shrinkage. It results in angular distortion of thin block. Final maximum displacement, 17mm occurs around welding line. The maximum residual stress happens at the welding line, where the stress is above the yield strength. Also, the maximum equivalent plastic strain occurs at the welding line. The plastic strain of first pass is more than that of second pass. The flatness of plate in longitudinal direction is calculated in parallel with the direction of girder and compared with deformation standard of ${\pm}15mm$. Calculated value is within the standard range. The flatness of plate in transverse direction is calculated in perpendicular to the direction of girder and compared with deformation standard of ${\pm}6mm$. It satisfies the standard. Buckle of plate is calculated between each longitudinal and compared with the deformation standard. All buckle value is within the standard range of ${\pm}6mm$.

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