• 제목/요약/키워드: wet processing

검색결과 283건 처리시간 0.022초

환원/침탄공정에 의한 TiC/Co 복합분말 합성 (Synthesis of TiC/Co Composite Powder by the Carbothermal Reduction Process)

  • 이길근;하국현
    • 한국분말재료학회지
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    • 제16권5호
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    • pp.310-315
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    • 2009
  • Ultra-fine TiC/Co composite powder was synthesized by the carbothermal reduction process without wet chemical processing. The starting powder was prepared by milling of titanium dioxide and cobalt oxalate powders followed by subsequent calcination to have a target composition of TiC-15 wt.%Co. The prepared oxide powder was mixed again with carbon black, and this mixture was then heat-treated under flowing argon atmosphere. The changes in the phase, mass and particle size of the mixture during heat treatment were investigated using XRD, TG-DTA and SEM. The synthesized oxide powder after heat treatment at 700$^{\circ}C$ has a mixed phase of TiO$_2$ and CoTiO$_3$ phases. This composite oxide powder was carbothermally reduced to TiC/Co composite powder by the solid carbon. The synthesized TiC/Co composite powder at 1300$^{\circ}C$ for 9 hours has particle size of under about 0.4 $\mu$m.

Fe-8 wt%Ni 나노합금분말 사출성형체의 소결특성 및 표면조도 (Surface Roughness and Sintering Characteristics of Fe-8 wt%Ni Component Fabricated by PIM)

  • 차범하;이재성
    • 한국분말재료학회지
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    • 제16권5호
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    • pp.342-350
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    • 2009
  • Development of nanoparticulate materials technology is essential to processing of highly functional nanoparticulate materials and components with small and complex shape. In this paper, the effect of particle size on surface roughness and shrinkage of sintered Fe-8 wt%Ni nanopowder components fabricated by PIM were investigated. The Fe-8 wt%Ni nanopowder was prepared by hydrogen reduction of ball-milled Fe$_2$O$_3$-NiO powder. Feedstock of nanopowder prepared with the wet-milled powder was injection molded into double gear shaped part at 120$^{\circ}C$. After sintering, the sintered part showed near full densified microstructure having apparently no porosity (98%T.D.). Surface roughness of sintered bulk using nanopowder was less than 815 nm and it was about seven times lower than 7 $\mu$m that is typically obtainable from a sintered part produced from PIM.

HCL 습식 에칭에 의한 ZnO:Al 투명전도막의 전기적, 광학적 특성 (The electrical and optical properties of transparent ZnO:Al films using HCl wet chemical etching)

  • 유진수;이정철;강기환;김석기;윤경훈;송진수;박이준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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    • pp.62-65
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    • 2002
  • Transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Coming 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures $({\leq}300^{\circ}C)$, the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

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진공식(眞空式) 쓰레기 파이프라인수송(輸送) System 개발(開發) (The Development of the Waste Pneumatic Transportation System)

  • 박중현;김봉근;권봉기
    • 상하수도학회지
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    • 제10권3호
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    • pp.115-132
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    • 1996
  • The present problems concerning the control of generation, storage, collection, transfer and transport, processing and disposal of the municipal waste are serious. And the transportation of the municipal waste is recently a important part of solid waste treatment and disposal. The waste pneumatic transportation system is expected to be an effective method for use in solving that problems. In this study, pneumatic transportation system was applied to 2,000-5,000 households of public/group housing for economic and technical analysis on the basis of data for working and operation. The proper equipment must be selected through economic and technical analysis for generation and properties of waste because the equipment in facilities of system is various. And the efficient operation method should be studied on the basis of information on the record of oeration. As the wet food waste clogs the pipeline, it is necessary to examine under the actual condition. The maximum unit waste generation rate based on the assumption that each household is comprised of 3.20 people is determined $2,340g/household{\cdot}day$, and it is included the 50% increase of seasonal and daily change.

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반도체 습식 HF 최종 공정 중 실리콘 표면의 소수성이 Water Mark형성에 미치는 영향 (The Effect of the Hydrophobicity of Silicon Surface on the Formation of the Water Marks during HF-last Wet Chemical Processing)

  • 한정훈;김숭환;박진구;박종진
    • 한국재료학회지
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    • 제7권10호
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    • pp.832-837
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    • 1997
  • 본 연구에서는 반도체 소자의 수율을 현저히 저하시키는 반도체 습식 세정 시 건조 후 웨이퍼 표면에 형성된 water mark의생성 원인을 고찰하였다. 이를 위해 초순수수의 물방울을 다른 접촉각의 시편 위에 고의로 잔류시킨 후 질소 및 산소 분위기에서 건조시켰다. 건조 분위기와 상관없이 HF 처리된 소수성의시편 뿐만 아니라 친수성의 시편에서도 water mark이 관찰되었다. 생성된 water mark의 크기는 분위기에 무관하게 접촉각이 증가함에 따라 감소하였다. 그러나 산소 분위기에서 HF처리된 시편은 건조 후 질소 분위기에서 생성된 water mark의 크기보다 2배이상 크게 형성되었다. 이들 산소 및 질소 분위기에서 HF 처리된 실리콘 시편 위에 생성된 water mark의 성분을 AES(Auger Electron Spectroscopy)로 분석한 결과 water mark는 실리콘과 산소의 화합물 형태로 존재함을 확인하였다. AAS(Atomic Absorption Spectroscopy)분석 결과 건조 분위기에 상관 없이 HF처리된 실리콘 시편 위에 물방울을 30분 잔류시 물방울 내의 실리콘 농도가 증가하였다. 또한 물방울내 ozone을 첨가하여 실리콘 표면을 산화 시켰을 때 물방울과 표면의 접촉각 감소와 water mark의크기의 증가를 초래하였다.

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The effect of particle size on the determinability of maize composition in reflection mode.

  • MVaradi, Maria;Turza, Sandor
    • 한국근적외분광분석학회:학술대회논문집
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    • 한국근적외분광분석학회 2001년도 NIR-2001
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    • pp.1129-1129
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    • 2001
  • Maize, in Hungary, is the fodder-plant grown in the biggest quantity. It is not only used as a fodder but other products such as iso-sugar are made from it, too. The quality of the fodder and the produce is largely dependent on the composition of the supplied maize to the processing site. The examination of quality parameters besides conventional methods are investigated and measured by NIR spectroscopy on a routine basis. The investigated parameters are the following: water, total protein, starch and oil content. The accuracy and precision of determining these parameters we, apart from the wet chemical methods, influenced by sample preparation to a great extent. One of the main features of this is the sample particle size and its distribution across the sample. The uneven distribution of particle size negatively influences the measurement accuracy, decreases model robustness and prediction ability. With these in mind the aim of our experiment was to investigate the effect of particle size on the accuracy of maize composition determination using reflection measurement setup. In addition, we tested different spectrum transformations, which are suitable for canceling this effect. In our experiment 47 samples were analyzed with three different mesh sizes (1.5mm, 1.8mm and 2mm). The results of our findings are presented here.

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매엽식 방법을 이용한 웨이퍼 후면의 박막 식각 (Etching Method of Thin Film on the Backside of Wafer Using Single Wafer Processing Tool)

  • 안영기;김현종;구교욱;조중근
    • 반도체디스플레이기술학회지
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    • 제5권2호
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    • pp.47-49
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    • 2006
  • Various methods of making thin film is being used in semiconductor manufacturing process. The most common method in this field includes CVD(Chemical Vapor Deposition) and PVD(Physical Vapor Deposition). Thin film is deposited on both the backside and the frontside of wafers. The thin film deposited on the backside has poor thickness profile, and can contaminate wafers in the following processes. If wafers with the thin film remaining on the backside are immersed in batch type process tank, the thin film fall apart from the backside and contaminate the nearest wafer. Thus, it is necessary to etch the backside of the wafer selectively without etching the frontside, and chemical injection nozzle positioned under the wafer can perform the backside etching. In this study, the backside chemical injection nozzle with optimized chemical injection profile is built for single wafer tool. The evaluation of this nozzle, performed on $Si_3N_4$ layer deposited on the backside of the wafer, shows the etching rate uniformity of less than 5% at the etching rate of more than $1000{\AA}$.

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이종 금속이 코팅된 금속소재를 이용한 인쇄전자소자용 선폭 10㎛급 패턴 가공 (10㎛-wide Pattern Engraving using Metal Specimens coated with a heterogeneous metal for Printed Electronics)

  • 손현기;카오 후안 빈;조용권;신동식;최지연
    • 한국레이저가공학회지
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    • 제17권4호
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    • pp.20-23
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    • 2014
  • In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are patterned in microscale by the indirect laser method. Since based on the wet etch process, the indirect method is neither environment-friendly nor suitable for making a printing roll with patterns narrower than $20{\mu}m$. In this paper, we have directly engraved micro-patterns into a Zn-coated metal specimens using a picosecond laser in order both to engrave $10{\mu}m$-wide patterns and to improve the pattern profile. Experiments showed that it is possible to engrave $10{\mu}m$-wide patterns with an a rectangular-shaped profile which is necessary for the dimensionally accurate printing.

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인디고를 이용한 아스킨 섬유의 염착특성 (Dyeing Properties of Askin Fabric with Indigo)

  • 김수호;김영성;홍진표;윤석한;손영아
    • 한국염색가공학회지
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    • 제21권2호
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    • pp.1-6
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    • 2009
  • Recently, polyester is widely used in textile fabrics due to its application potentials in various fields. It is known that askin fabric is prepared with mainly polyester and is enjoyed with various end uses such as marine clothing, underwear, shirts, swimming suits and so on. For this purpose, color fastness should be considered with great importance during its wet processing step. In this context, vat dyes were very much attracted due to the advantage of superior fastness property. Thus, we have used indigo dye towards askin fabric dyeings and investigated corresponding properties namely, dyeing temperature, concentration of dye, reducing agent amount and alkali amount. The results showed that higher color strengths of indigo dyeing on askin fabric were obtained at $110^{\circ}C$, 8% o.w.f, 3g/l, 5g/l, respectively. The color fastness to washing was considerable generally.

습식공정에 의한 형광물질 $SrAl_2O_4:Eu$ 분말 합성 및 형광 특성 (Study on the Synthesis of Phosphor, $SrAl_2O_4:Eu$ by Wet Processing and its Characteristics of Photoluminescence)

  • 박우식;김정식
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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    • pp.161-164
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    • 2003
  • 본 연구에서는 수열합성법으로 $SrAl_2O_4:Eu$ 형광체 분말을 합성하여 이들의 발광 특성과 장잔광 특성 등에 대해서 고찰하였다. 증류수에 $Sr(NO_3)_2,\;Al(NO_3)_3{\cdot}9H_2O,\;Eu(NO_3)_3{\cdot}6H_2O$ 등의 금속염을 용해시킨 용액을 $NH_4OH$ 수용액으로 pH를 적당히 조절하고 고온 고압의 Autoclave 반응용기 내에서 반응시켰다. 이렇게 합성된 분말은 균일한 입도 분포를 나타내었으면, sub-micron 크기의 초미세 분말이었다. 합성된 $SrAl_2O_4:Eu$ 초미세 분말을 $Ar-H_2$ 가스 환원분위기에서 $1100-1400^{\circ}C$ 온도로 2시간동안 열처리시켜서 형광 특성을 나타내도록 만들었다. 분말의 여기 및 발광 특성을 측정한 길과, 발광파장을 520 nm로 고정시켜 측정한 여기스펙트럼은 $250\~450nm$의 넓은 파장영역에 걸쳐 여기가 일어났고, 발광스펙트럼은 520 nm에서 최대 피크를 나타내었다. 또한 10분간 여기 시킨 후 520 nm 파장에 대한 잔광 특성이 1000분 이상 지속되는 우수한 장잔광 특성을 나타내었다.

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