• Journal of KIISE:Computer Systems and Theory
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• v.32 no.3
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• pp.133-147
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• 2005

Various types of ray-tracing methods are used to predict the quantity measures of radiation illumination, the uniformity of illumination, radiation performance of LCD BLU(Hack-Light Unit). The uniformity of radiation illumination is one of the most important design factor of BLU and is usually controlled by the diffusive-ink pattern printed on the bottom of light-guide panel of BLU. Therefore it is desirable to produce an improved (ideally, the optimal) ink pattern to achieve the best uniformity of radiation illumination. In this paper, we applied the Welder-Mead simplex-search method among various direct search method to compute the optimal ink pattern. Direct search methods are widely used to optimize the functions which are often highly nonlinear, unpredictably discontinuous, and nondifferentiable, The ink-pattern controlling the uniformity of radiation illumination is one type of these functions. In this paper, we found that simplex search methods are well suited to computing the optimal diffusive-ink pattern. In extensive numerical testing, we have found the simplex search method to be reasonably efficient and reliable at computing the optimal diffusive-ink pattern. The result also suggests that optimization can improve the functionality of simulation tools which are used to design LCD BLU.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.22 no.1
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• pp.42-51
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• 2012

Objectives: To compare the exposure level of extremely low frequency (ELF) magnetic fields among semiconductor workers, shipyard welders and office workers. Methods: To measure the ELF magnetic field concentration, EMDEX LITE (Enertech, USA) were used and monitored for eight hours continuously. Five companies handling the electric and magnetic field (EMF) source were investigated, which the exposure groups were classified into three groups: semiconductor workers, welders, and office workers. Welder group was chosen as a high exposed group and office group as a low exposed group. Results: The arithmetic mean (${\pm}SD$) and geometric mean (GSD) of personal exposure level of semiconductor workers were 0.73 (${\pm}1.33$) ${\mu}T$, 0.43 (2.88) ${\mu}T$, respectively. The ceiling value ranged between 0.18 and 123.2 ${\mu}T$. Welders were exposed high with the arithmetic mean value of 3.46 (${\pm}\;13.46$) ${\mu}T$ and geometric mean value of 0.45 (4.70) ${\mu}T$, respectively, and ceiling value range of 75.5~129.6 ${\mu}T$. The exposure levels of office workers were low compared to other exposed groups; the arithmetic mean 0.05 (${\pm}0.13$) ${\mu}T$, geometric mean 0.03 (2.38) ${\mu}T$ and ceiling value range 0.37~3.35 ${\mu}T$. This study revealed statistically significant differences of the mean ELF magnetic field exposure doses among three groups (p < 0.01). Conclusions: The average ELF magnetic field exposure doses of semiconductor workers were much higher than those of office workers in control group, but were lower than those of welders in high exposure group.

• Journal of radiological science and technology
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• v.34 no.1
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• pp.17-25
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• 2011

In this study, we examined the impact caused by chronic exposure to Mn by investigating the degree of brain activation based on the data of recognition activities using fMRI (functional magnetic resonance imaging). A questionnaire survey, blood tests, and fMRI tests were carried out with respect to two groups. Group 1 was an exposure group consisting of 15 male workers who are 34 years old or older, and who worked for longer than 10 years in a shipbuilding factory as a welder. Group 2 was a control group consisting of 15 workers in manufacturing industries with the same gender and age. The results showed that blood Mn concentration of Group 1($1.3\;{\mu}g/dl$) was significantly higher than that of Group 2($0.8\;{\mu}g/dl$)(p < 0.001), and Pallidal Index (PI) of Group 1 was also significantly higher than that of Group 2 (p < 0.001). PI value of the group whose blood Mn concentration was $0.93\;{\mu}g/dl$ or higher was significantly higher than that of the group whose blood Mn concentration was less than $0.93 \;{\mu}g/dl$ (p < 0.001). As for brain activity area within the control group, the right and the left areas of occipital cortex showed significant activity and the left area of middle temporal cortex, the right area of superior inferior frontal cortex and inferior parietal cortex showed significant activity. Unlike the control group, the exposure group showed significant activity on the right area of superior inferior temporal cortex, the left of insula area. In the comparison of brain activity areas between the two groups, the exposure group showed significantly higher activation than the control group in such areas as the right inferior temporal cortex, the left area of superior parietal cortex and occipital cortex, and cerebellum including middle temporal cortex. However, in nowhere the control group showed more activated area than the exposure group. As the final outcome, chronic exposure to Mn increased brain activity during implementation of arithmetic task. In an identical task, activation increased in superior inferior temporal cortex, and insula area. And it was discovered that brain activity increase in temporal area and occipital area was more pronounced in the exposure group than in the control group. This result suggests that chronic exposure to Mn in the work environment affects brain activation neuro-network.