• International journal of advanced smart convergence
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• 제10권1호
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• pp.159-165
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• 2021

Electronic devices used in the mobile environments fabricated under the plasma conditions in high vacuum system. Especially for the development of advanced electronic devices, high quality plasma as the process conditions are required. For this purpose, the variable conductance throttle valves for controllable plasma employed to the high vacuum system. In this study, we analyzed the effects of throttle valve applications on vacuum characteristics simulated to obtain the optimum design modelling for plasma conditions of high vacuum system. We used commercial simulator of vacuum system, VacSim(multi) on this study. Reliability of simulator verified by simulation of the commercially available models of high vacuum system. Simulated vacuum characteristics of the proposed modelling agreed with the observed experimental behaviour of real systems. Pressure limit valve and normally on-off control valve schematized as the modelling of throttle valve for the constant process-pressure of below 10-3 torr. Simulation results plotted as pump down curve of chamber, variable valve conductance and conductance logic of throttle valve. Simulated behaviors showed the applications of throttle valve sustained the process-pressure constantly, stably, and reliably in plasma process.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.183-183
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• 2012

In the era of 45 nm or beyond technology, conventional etch mask using photoresist showed its limitation of etch mask pattern collapse as well as pattern erosion, thus hard mask in etching became necessary for precise control of etch pattern geometry. Currently available hard mask materials are amorphous carbon and polymetric materials spin-on containing carbon or silicon. Amorphous carbon layer (ACL) deposited by PECVD for etch hard mask has appeared in manufacturing, but spin-on carbon (SOC) was also suggested to alleviate concerns of particle, throughput, and cost of ownership (COO) [1]. SOC provides some benefits of reduced process steps, but it also faced with wiggling on a sidewall profile. Diamond like carbon (DLC) was also evaluated for substituting ACL, but etching selectivity of ACL was better than DLC although DLC has superior optical property [2]. Developing a novel material for pattern hard mask is very important in material research, but it is also worthwhile eliminating a potential issue to continuously develop currently existing technology. In this paper, we investigated in-situ dry-cleaning (ISD) monitoring of ACL coated process chamber. End time detection of chamber cleaning not only provides a confidence that the process chamber is being cleaned, but also contributes to minimize wait time waste (WOW). Employing Challenger 300ST, a 300mm ACL PECVD manufactured by TES, a series of experimental chamber cleaning runs was performed after several deposition processes in the deposited film thickness of $2000{\AA}$ and $5000{\AA}$. Ar Actinometry and principle component analysis (PCA) were applied to derive integrated and intuitive trace signal, and the result showed that previously operated cleaning run time can be reduced by more than 20% by employing real-time monitoring in ISD process.

• 한국진공학회지
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• 제13권2호
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• pp.54-58
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• 2004

스테인레스 스틸로 가공된 진공용기에 제조회사와 사양이 각각 다른 세 개의 열음극 전리진공게이지를 부착하고 실험실 온도변화에 따른 게이지들의 압력요동 특성을 조사하였다. 상온 근방의 최소 $20 ^{\circ}C$와 최대 $26 ^{\circ}C$에서의 압력 편차는 각각 IG1은 5.0 %, IG2는 5.3 %, 그리고 IG3는 10.3 %이었다. 그러나 온도 $21.5^{\circ}C$에서 $22.5^{\circ}C$구간에서의 압력변화는 모두 게이지들의 불확도 보다 작고 안정한 성능을 보였다. 본 연구결과 상온 고진공에서 열음극 전리진공게이지의 압력변화는 게이지 자체의 특성 때문이 아니고 실험실 온도 때문에 변하는 압력변화에 기인한 것임을 알 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.193-193
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• 2012

In thin film silicon solar cells, p-i-n structure is adopted instead of p/n junction structure as in wafer-based Si solar cells. PECVD is the most widely used thin film deposition process for a-Si:H or ${\mu}c$-Si:H solar cells. Single-chamber PECVD system for a-Si:H solar cell manufacturing has the advantage of lower initial investment and maintenance cost for the equipment. However, in single-chamber PECVD system, doped and intrinsic layers are deposited in one plasma chamber, which inevitably impedes sharp dopant profiles at the interfaces due to the contamination from previous deposition process. The cross-contamination between layers is a serious drawback of single-chamber PECVD system. In this study, a new plasma process to solve the cross-contamination problem in a single-chamber PECVD system was suggested. In order to remove the deposited B inside of the plasma chamber during p-layer deposition, a high RF power was applied right after p-layer deposition with SiH4 gas off, which is then followed by i-layer, n-layer, and Ag top-electrode deposition without vacuum break. In addition to the p-i interface control, various interface control techniques such as FTO-glass pre-annealing in O2 environment to further reduce sheet resistance of FTO-glass, thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, and hydrogen plasma treatment prior to n-layer deposition, etc. were developed. The best initial solar cell efficiency using single-chamber PECVD system of 10.5% for test cell area of 0.2 $cm^2$ could be achieved by adopting various interface control methods.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.912-915
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• 2004

A vacuum environment is very important for NGL(Next Generation Lithography) apparatuses such as EUVL(Extreme Ultra Violet Lithography) or EPL(Electron Projection Lithography) and so on. The performance of these systems is dominated by vacuum level of processing and positioning accuracy of a stage. So, ultra-precision stage usable in a high vacuum level is needed for the improved performance of these devices. In contrast to atmospheric condition, a special attention must be paid to guide bearing, actuator and other elements. In this paper, air bearing is adopted because of its very high motional accuracy. So, air bearing is designed to be vacuum compatible using differential exhaust method, which prevents air from entering into vacuum chamber. For this, leakage analysis is performed theoretically and verified from experiment.

• Journal of Advanced Marine Engineering and Technology
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• 제21권1호
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• pp.26-36
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• 1997

Recently, the new refrigerating system, using non - fluorinated hydrocarbon refrigerants has to be developed for the agricultural fields. One of that kinds of systems is the cooling system using the water vapor and vacuum, in which the water evaporate at the low temperature under vacuum and absorb the large amount of the latent heat. If vapor with large amount of latent heat is removed from the system, the system is cooled accordingly. The characteristics of cooling under the vacuum was observed and measured using experimental apparatus, which is consisted of vacuum chamber, the ejectors, the pumps and the measurement apparatus. As the results of experiments, we know that the evaporation in the vacuum occurs vigorously when the materials to be cooled has more amounts of heat before cooling, and by which effects the materials can be cooled. The cooling vacuum system is more efficient than other methods when the agricultural products is chilled or dried.

• International journal of advanced smart convergence
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• 제12권4호
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• pp.217-223
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• 2023

In this study, we compared the VacCAD and VacTran, commercial vacuum simulators, to investigate the simulation applicability and efficiency as vacuum simulation software. It was verified on reliability and simplicity of simulation modelling, and characteristics of the pump combinations, pumping down curves, and employed vacuum materials. First, usability of simulation schematics was estimated through the modeling tools and the overall simulation characteristics of each simulator were compared to evaluate the applicability in practice. Simulation reliability of each simulator was also probed by comparing the pumping performance characteristics of commercial high vacuum system models. In addition, the degree of tolerances on both simulators was also evaluated through pumping down analysis considering outgassing effect due to chamber material variations. The higher effectiveness and expediency of VacCAD than VacTran has been presented, and it was also expected that the utilization of VacTan in vacuum applications to be increased due to the higher availability of modelling variations.

• 한국진공학회지
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• 제3권4호
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• pp.389-394
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• 1994

설계변경된 sector 챔버를 제작하고 저장링 챔버로서 성능을 알기 위하여 각종 진공실험을 하였 다. 가스방출률은 낮은 10-13 Torr.1/sec/cm2 이고 누설률은 1-10-10 Torr.1/sec 이하이며 2회 ba-keout과 NEG활성화후 얻어진 최종진공도는 낮은 10-11 Torr이었다.이러한 결과는 저장링 sector 챔버으 진공요 구조건을 충분히 만족시킨다.

• 한국항공우주학회지
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• 제41권10호
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• pp.833-839
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• 2013

위성체는 지상에서 우주환경시험을 거쳐 기능 및 작동상태를 점검해야 하며, 이를 위해서는 우주환경을 모사 할 수 있는 우주환경 모사장비가 필요하다. 위성체 및 위성체의 부품 성능을 검증하기 위해 사용되는 열진공 챔버는 진공용기, 진공시스템, 열제어 시스템 등으로 구성이 된다. 특히, 고온 및 극저온의 열환경을 모사하는 열제어 시스템이 열진공 챔버의 핵심이라고 할 수 있으며, 열제어 시스템의 성능은 극저온 블로워의 성능에 의해 결정된다. 본 논문에서는 극저온 블로워의 유동 해석과 블레이드의 구조해석을 통해 원심팬을 설계 하였으며, 구동부와 유체부의 열전달 방지를 위한 열장벽, 모터의 과열 방지를 위한 냉각 시스템 등이 설계되었으며, 이는 열해석을 통해 검증 되었다. 최종적으로 성능실험을 수행하여 극저온 블로워의 성능을 확인하였다.

• Journal of Astronomy and Space Sciences
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• 제26권3호
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• pp.403-416
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• 2009

한국항공우주연구원에서는 기상탑재체, 해양탑재체 및 통신탑재체를 탑재한 정지궤도 위성인 통신해양기상위성을 개발하고 있다. 한국항공우주연구원에서 자체 개발한 대형 열진공 챔버를 이용하여 통신해양기상위성의 열평형 시험을 수행 할 예정이다. 열평형 시험의 주목적은 열해석 모델을 보정하고 열제어 설계를 검증하는데 있다. 통신해양기상위성의 고온 열평형 시험을 위해 남쪽과 북쪽 방열판 위에 외부 열유입량을 모사하기 위한 히팅플레이트를 장착하고, 액화질소 및 질소가스를 이용하여 히팅플레이트의 온도를 90K에서 260K 사이로 조절할 예정이다. 또한 열진공 챔버의 벽면은 심우주의 낮은 온도를 모사하기 위해 열평형 시험동안 액화질소를 이용하여 90K로 유지할 예정이다. 이 논문에서는 통신해양기상위성의 열평형 시험을 위한 열진공 챔버, 탑재체를 위한 타깃, 히팅플레이트 등 위성 모델링에 관한 내용과 열평형 시험 예측을 위한 경계조건, 부품의 작동 상태 및 온도 예측에 관해 다루고자 한다. 또한 새로이 개발한 히팅플레이트를 이용하여 열평형 시험을 수행하는 방법에 대한 타당성을 검토하고자 한다.