• International journal of advanced smart convergence
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• 제8권3호
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• pp.27-38
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• 2019

I reviewed about dyeing fastness and functional properties of the non-mordant dyed cotton and iron mordant dyed cotton with astringent persimmon juice. In the UV-VIS spectrum of astringent persimmon juice, the maximum absorption wavelength of the juice was 272.0 nm, which was a characteristic peak of tannin. In dyeing fastness, light fastness of the non-mordant dyed cotton was a little low at grade 2~3. But by the iron mordant treatment, the light fastness was good at grade 4. Dry cleaning fastness to discoloration and contamination was excellent at grade 4~5 for both the non-mordant dyed cotton and iron-mordant dyed cotton. Their rub fastness were grade 3 and grade 2~3 respectively, in the dry condition, and grade 2~3 and grade 3 respectively, in the wet condition. In the perspiration fastness of the non-mordant dyed cotton, the discoloration from acidity and alkalinity was grade 3~4 and grade 3, respectively, and contamination from acidity and alkalinity was relatively good at grade 4. Meanwhile, in the perspiration fastness of the non-mordant dyed cotton, discoloration from acidity and alkalinity was fair, both recording grade 3~4, and contamination from acidity and alkalinity was very good, both recording grade 4~5. In the ultraviolet protection effect of the non-mordant dyed cotton and iron-mordant dyed cotton, the ultraviolet protection factor was both 50+, both of which showed an excellent ultraviolet blocking effect. And the protection rate of UV-A appeared 98.4% and 99.1%, respectively, and the protection rate of UV-B showed 98.7% and 99.2, respectively. In addition, both exhibited an excellent deodorization rate over 99.9% or more, irrespective of the passage of time. Also, both showed an excellent antimicrobial activity over 99.9% or more against Staphylococcus aureus and Klebsiella pneumoniae.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.312.1-312.1
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• 2016

We have deposited ZnO thin films by ultraviolet (UV) enhanced atomic layer deposition using diethylznic (DEZ) and water (H2O) as precursors with UV light. The atomic layer deposition relies on alternating dose of the precursor on the surface and subsequent chemisorption of the precursors with self-limiting growth mechanism. Though ALD is useful to deposition conformal and precise thin film, the surface reactions of the atomic layer deposition are not completed at low temperature in many cases. In this experiment, we focused on the effects of UV radiation during the ALD process on the properties of the inorganic thin films. The surface reactions were found to be complementary enough to yield uniform inorganic thin films and fully react between DEZ and H2O at the low temperature by using UV irradiation. The UV light was effective to obtain conductive ZnO film. And the stability of TFT with UV-enhanced ZnO was improved than ZnO by thermal ALD method. High conductive UV-enhanced ZnO film have the potential to applicability of the transparent electrode.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1069-1072
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A $5{\times}5{\times}0.09$ inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and discuss the results including SEM images.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.199-202
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a 5$\times$5$\times$0.09 in. quartz stamp whose critical dimension is 377 nm was fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply tile fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer Experiments have shown that the multi-dispensing method can enable UV-NIL rising a large-area stamp.

• 유체기계공업학회:학술대회논문집
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• 유체기계공업학회 2005년도 연구개발 발표회 논문집
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• pp.126-132
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• 2005

UV disinfection system allows the disinfection of municipal and industrial water and wastewater without the use of expensive chlorination and dechlorination techniques, labor intensive equipments In traditional ultraviolet systems the UV lamps are seperated from water by quartz sleeves. quartz is one of. the few materials that is virtually transparent to UV light, the UV lamp is placed inside the Quartz sleeve. UV light from the lamp is passed through the quartz and into the water, thereby providing disinfection. In fluoropolymer tube-used non-contact UV systems, the water flows through fluoropolymer plastic tubes. banks of UV lamps surround these tubes such that each tube gets exposed to ultra violet light from all sides. in non-contact design the lamps operates at almost constant temperature. this design is extremly efficient in the utilization of UV energy and superior to conventional contact- systems.

• 한국식품위생안전성학회지
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• 제38권1호
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• pp.26-30
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• 2023

본 연구에서는 자외선 살균기의 미생물 오염 상태를 분석하고 위생관리 방안을 제시하고자 하였다. 본 실험에 사용된 자외선 살균기는 전라남도 소재 일부 보육시설 98곳의 자외선 살균기를 대상으로 하였다. 일반세균 및 대장균군은 식품공전 미생물 시험법에 따라 실험하였다. 일반 세균은 98개 보육시설 중 67개소(68.4%), 대장균군은 5개 소(5.1%)에서 검출되었다. 식중독세균 실험 결과 Salmonella spp. 등 6종의 식중독세균은 검출되지 않았지만 B. cereus 는 98개 보육시설 중 1개소(2.8%)에서 검출되었다. 자외선 램프 교체 주기에 따른 일반세균 검출율은 3개월 이내가 6개 보육시설 중 3개소(50%), 3개월 이상 6개월 이내가 5개 보육시설 중 3개소(60%), 6개월 이상이 87개 보육시설 중 61개소(70.1%)로 나타났다. 대장균군 검출율은 6개월 이내에는 검출되지 않았으나 6개월 이상이 87개 보육시설 중 5개소(5.7%)로 나타났다. 자외선 살균기의 미생물 오염도는 램프 교체 주기가 길어질수록 미생물 오염도가 높게 나타났다. 또한 자외선 램프 교체 주기가 6개월 이상인 87개 보육시설 중 23개소(26.4%)의 자외선 살균기 반사판에는 물기가 있고 청소상태가 불량한 것으로 나타났다. 이러한 결과를 종합해 볼 때 보육시설에서 사용 중인 자외선 살균기의 위생관리를 위해 주기적인 청소 와 자외선 램프 교체가 필요한 것으로 판단된다. 또한 보육시설 급식담당자들에게 자외선 살균기 청결과 램프 교체에 대한 지속적인 교육이 필요할 것으로 판단되었다.

• 한국인쇄학회지
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• 제15권2호
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• pp.107-115
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• 1997

The ultraviolet(UV)-curable materials are widely used in inks and coatings. In this paper is designed to develop materials having flexibility and functionality with UV-curable acrylate monomer and alkyd resin. At first, phase diagram is prepared for miscibility of UV -curable acrylate monomer with alkyd resin. Also the gel fraction and dynamic viscosity are measured to curing speed of mixing system. In results, it has been demonstrated that miscibility and curing speed are greatly influenced by alkyd resin content.

• Toxicological Research
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• 제15권1호
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• pp.35-38
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• 1999

RNA synthesis rate was measured at different time points after UV irradiation in various xeroderma pigmentosum (XP) cells including complementation groups F and G. The RNA synthesis was assayed by measuring 3H-uridine incorporation. In normal cells, recovery of RNA synthesis was initiated at about 6 hr ager UV irradiation and reached to the same level as in unirradiated cells at 24hr after UV irradiation. By contrast, no such recovery was observed in group F,G XP cells.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.246-249
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• 2009

A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2004년도 춘계종합학술대회
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• pp.324-326
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• 2004

엑시머 레이저로 여기되는 분포제환 색소레이저(DFDL: Distributed Feedback Dye Laser)로부터 616nm의 레이저 펄스를 얻고, 이를 제2고조파 발생에 의한 파장변환을 통해 308nm의 극초단 자외 광펄스를 얻었다. 또한 3단의 XeCl 엑시머 레이저 증폭기를 구성하여 자외 광펄스의 증폭을 행하였다.