• International journal of advanced smart convergence
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• v.8 no.3
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• pp.27-38
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• 2019

I reviewed about dyeing fastness and functional properties of the non-mordant dyed cotton and iron mordant dyed cotton with astringent persimmon juice. In the UV-VIS spectrum of astringent persimmon juice, the maximum absorption wavelength of the juice was 272.0 nm, which was a characteristic peak of tannin. In dyeing fastness, light fastness of the non-mordant dyed cotton was a little low at grade 2~3. But by the iron mordant treatment, the light fastness was good at grade 4. Dry cleaning fastness to discoloration and contamination was excellent at grade 4~5 for both the non-mordant dyed cotton and iron-mordant dyed cotton. Their rub fastness were grade 3 and grade 2~3 respectively, in the dry condition, and grade 2~3 and grade 3 respectively, in the wet condition. In the perspiration fastness of the non-mordant dyed cotton, the discoloration from acidity and alkalinity was grade 3~4 and grade 3, respectively, and contamination from acidity and alkalinity was relatively good at grade 4. Meanwhile, in the perspiration fastness of the non-mordant dyed cotton, discoloration from acidity and alkalinity was fair, both recording grade 3~4, and contamination from acidity and alkalinity was very good, both recording grade 4~5. In the ultraviolet protection effect of the non-mordant dyed cotton and iron-mordant dyed cotton, the ultraviolet protection factor was both 50+, both of which showed an excellent ultraviolet blocking effect. And the protection rate of UV-A appeared 98.4% and 99.1%, respectively, and the protection rate of UV-B showed 98.7% and 99.2, respectively. In addition, both exhibited an excellent deodorization rate over 99.9% or more, irrespective of the passage of time. Also, both showed an excellent antimicrobial activity over 99.9% or more against Staphylococcus aureus and Klebsiella pneumoniae.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.312.1-312.1
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• 2016

We have deposited ZnO thin films by ultraviolet (UV) enhanced atomic layer deposition using diethylznic (DEZ) and water (H2O) as precursors with UV light. The atomic layer deposition relies on alternating dose of the precursor on the surface and subsequent chemisorption of the precursors with self-limiting growth mechanism. Though ALD is useful to deposition conformal and precise thin film, the surface reactions of the atomic layer deposition are not completed at low temperature in many cases. In this experiment, we focused on the effects of UV radiation during the ALD process on the properties of the inorganic thin films. The surface reactions were found to be complementary enough to yield uniform inorganic thin films and fully react between DEZ and H2O at the low temperature by using UV irradiation. The UV light was effective to obtain conductive ZnO film. And the stability of TFT with UV-enhanced ZnO was improved than ZnO by thermal ALD method. High conductive UV-enhanced ZnO film have the potential to applicability of the transparent electrode.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1069-1072
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL. A $5{\times}5{\times}0.09$ inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and discuss the results including SEM images.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.199-202
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• 2003

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a 5$\times$5$\times$0.09 in. quartz stamp whose critical dimension is 377 nm was fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply tile fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer Experiments have shown that the multi-dispensing method can enable UV-NIL rising a large-area stamp.

• 유체기계공업학회:학술대회논문집
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• 2005.12a
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• pp.126-132
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• 2005

UV disinfection system allows the disinfection of municipal and industrial water and wastewater without the use of expensive chlorination and dechlorination techniques, labor intensive equipments In traditional ultraviolet systems the UV lamps are seperated from water by quartz sleeves. quartz is one of. the few materials that is virtually transparent to UV light, the UV lamp is placed inside the Quartz sleeve. UV light from the lamp is passed through the quartz and into the water, thereby providing disinfection. In fluoropolymer tube-used non-contact UV systems, the water flows through fluoropolymer plastic tubes. banks of UV lamps surround these tubes such that each tube gets exposed to ultra violet light from all sides. in non-contact design the lamps operates at almost constant temperature. this design is extremly efficient in the utilization of UV energy and superior to conventional contact- systems.

• Journal of Food Hygiene and Safety
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• v.38 no.1
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• pp.26-30
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• 2023

In this study, we analyzed the microbial contamination level of ultraviolet sterilizer (UVS) chambers and suggested plans to improve hygiene management. In this study, UVS chambers targeted 98 UVS in some childcare centers in Jeollanam-do, Korea. Total aerobic bacteria and coliform bacteria were tested according to the Korean Food Code. Of the 98 UVS chambers, total aerobic bacteria were detected in 67 (68.4%) and coliform bacteria in 5 (5.1%). Six kinds of food-poisoning bacteria, including Salmonella spp., were not detected, but Bacillus cereus was detected in 1 (2.8%) out of 98 UVS chambers. According to the UV lamp replacement period, the detection rate of total aerobic bacteria was 3 (50%) out of 6 UVS within 3 months, 3 (60%) out of 5 UVS in 3 to 6 months, and 61 (70.1%) out of 87 UVS over 6 months. The detection rate of coliform bacteria according to the UV lamp replacement period was not detected within 6 months, however, they were detected in 5 (5.7%) out of 87 chambers after more than 6 months. The level of microbial contamination in the UVS chambers was higher as the lamp replacement period was longer. Considering these results, it was determined that the UVS chambers should be kept dry and clean, and the UV lamp should be replaced periodically. In addition, it is necessary to provide the staff catering for childcare centers with continuous education regarding the cleaning of UVS chambers and the replacement of UV lamps.

• Journal of the Korean Graphic Arts Communication Society
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• v.15 no.2
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• pp.107-115
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• 1997

The ultraviolet(UV)-curable materials are widely used in inks and coatings. In this paper is designed to develop materials having flexibility and functionality with UV-curable acrylate monomer and alkyd resin. At first, phase diagram is prepared for miscibility of UV -curable acrylate monomer with alkyd resin. Also the gel fraction and dynamic viscosity are measured to curing speed of mixing system. In results, it has been demonstrated that miscibility and curing speed are greatly influenced by alkyd resin content.

• Toxicological Research
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• v.15 no.1
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• pp.35-38
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• 1999

RNA synthesis rate was measured at different time points after UV irradiation in various xeroderma pigmentosum (XP) cells including complementation groups F and G. The RNA synthesis was assayed by measuring 3H-uridine incorporation. In normal cells, recovery of RNA synthesis was initiated at about 6 hr ager UV irradiation and reached to the same level as in unirradiated cells at 24hr after UV irradiation. By contrast, no such recovery was observed in group F,G XP cells.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.246-249
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• 2009

A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2004.05b
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• pp.324-326
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• 2004

We have obtained ultra-short pulses with a wavelength of 616 nm from a Distributed Feedback Dye Laser pumped by excimer laser. Using the second harmonic generation, we obtained ultra-short pulse at 308nm in ultraviolet region and also performed amplification in 3 stages of XeCl amplifiers.