• Journal of the Korean Applied Science and Technology
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• v.11 no.2
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• pp.99-103
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• 1994

A stability to the spreading solvent, which is acetonitrile, benzene, chloroform and acetonitrile-benzene(1:1, v/v) of (3-Alkyl benzimidazdium)-TCNQ(1:2) complex was investigated by UV-visible spectrometer and was confirmed stabilized on acetonitrile, acetonitrile-benzene (1:1, v/v) for five hours. Using Ultra pure water as subphase for Langmuir-Blodgett(LB) films, it was achived successively to fabricate the Y-type LB films of (3-Alkyl benzimidazolium)-TCNQ(1:2) complex. For the identification of (3-Alkyl benzimidazolium)-TCNQ(1:2) complex, UV-visible spectra was recorded on HP 8452A spectrometer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.11a
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• pp.221-224
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• 1996

We synthesized amphiphilic material including dye skeleton, p-phenylenediamine(PD) by attaching norma-decyl group of two strands at a part of coordinating atom, for obtaining reasonable design of LB uniform films. The synthesis of this compounds was quantitatively carried out under ultra pure state. This product was identified with FT-lR spectroscopy, UV absortion spectroscopy, and $^1$H-NMR spectroscopy, respectively. When manufacturing monolayer, we confirmed molecular area from pressure-area($\pi$-A) cutie of thiscompound onto the surface of the water. The spectroscopic approach also has done by UV absortion spectroscopy. It was shown that PD-complex LBfilms were deposited well with monolayer thickness. The conductivity based on I-V characteristics of PD-complex LB films were in the range of 10$^{-10}$ S/cm at room temperture. The microscopic properties by AFM, showed the good orientation of various monolayer or multilayer molecules

• Clean Technology
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• v.7 no.3
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• pp.215-223
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as electrolyzed water(EW) are being studied. In this work, intentionally contaminated Si wafers were cleaned using the electrolyzed water. The electrolyzed water was generated by an electrolysis system which consists of three anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH4Cl electrolyte, the oxidation-reduction potential and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.8, and -750mV and 10.0, respectively. AW and CW were deteriorated after electrolyzed, but maintained their characteristics for more than 40 minutes sufficiently enough for cleaning. Their deterioration was correlated with CO2 concentration changes dissolved from air. Contact angles of UPW, AW, and CW on DHF treated Si wafer surfaces were measured to be $65.9^{\circ}$, $66.5^{\circ}$ and $56.8^{\circ}$, respectively, which characterizes clearly the eletrolyzed water. To analyze the amount of metallic impurities on Si wafer surface, ICP-MS was introduced. It was known that AW was effective for Cu removal, while CW was more effective for Fe removal. To analyze the number of particles on Si wafer surfaces, Tencor 6220 were introduced. The particle distributions after various particle removal processes maintained the same pattern. In this work, RCA consumed about $9{\ell}$ chemicals, while EW did only $400m{\ell}$ HCl electrolyte or $600m{\ell}$ NH4Cl electrolyte. It was hence concluded that EW cleaning technology would be very effective for promoting environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.251-257
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning, high temperature process which consumes vast chemicals and ultra Pure water(UPW). This technology gives rise to the many environmental issues, therefore some alternatives have been studied. In this study, intentionally contaminated Si wafers were cleaned using the electrolyzed water(EW). The EW was generated by an electrolysis equipment which was composed of anode. cathode, and toddle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case $NH_4$Cl electrolyte, the oxidation-reduction potential(ORP) and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.7, and -750mV and 9.8, respectively. For cleaning metallic impurities, AW was confirmed to be more effective than that of CW, and the particle distribution after various particle removal processes was shown to be same distribution.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.5
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• pp.201-205
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• 2003

We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.

• The Transactions of the Korean Institute of Electrical Engineers D
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• v.52 no.5
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• pp.201-201
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• 2003

We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.3 no.2
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• pp.74-79
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• 2002

In the a rapid changes of the semiconductor manufacturing technologies for early 21st century, it may be safely said that a kernel of terms is the size increase of Si wafer and the size decrease of semiconductor devices. As the size of Si wafers increases and semiconductor device is miniaturized, the units of cleaning processes increases. A present cleaning technology is based upon RCA cleaning which consumes vast chemicals and ultra pure water (UPW) and is the high temperature process. Therefore, this technology gives rise to the environmental issue. To resolve this matter, candidates of advanced cleaning processes has been studied. One of them is to apply the electrolyzed water. In this work, Compared with surface on Si wafer with electrolyzed water cleaning and various chemicals cleaning, and analyzed Si wafer surface condition treated with elecoolyzed water by cleaning temperature and cleaning time. Especially. concentrate upon the contact angle. finally, contact angle on surface treated with cathode water cleaning is 17.28, and anode water cleaning is 34.1.

• Journal of the Korean Society of Food Science and Nutrition
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• v.44 no.12
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• pp.1771-1778
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• 2015

The study aimed to investigate the anti-obesity effects of 1% Rhus verniciflua vinegar (RV) supplementation in high-fat-diet (60% fat)-induced obese rats. A total of 50 4-wk-old male Sprague-Dawley rats were fed normal chow diet or maintained on high-fat diet (HFD) for 12 weeks to induce obesity and were then randomized into five groups as follows: normal diet+ultra-pure water (CON), HFD+ultra-pure water (OB-DW), HFD+1% acetic acid (OBAA), HFD+1% RV (OB-RV), and HFD+0.1% caffeine (OB-CF). AA was used as a control for RV, and caffeine was used as a positive control due to its weight reducing effect. After 2 months, body weight, organ and adipose tissue weights, serum lipids, hepatic lipids, adipocyte size, and cell number per spot level were analyzed. As a result, food efficiency ratio, abdominal adipose tissue weight, serum levels of total cholesterol, triacylglycerol, free fatty acids, coronary artery index, and fecal lipid were significantly reduced in the RV treatment group. In this study, we found that dietary RV improved obesity by increasing lipid excretion and reducing lipogenesis. These results suggest that RV has potential as a functional anti-obesity food.

• Clean Technology
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• v.7 no.3
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• pp.179-185
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• 2001

Some companies are trying to develop the microfiltration membranes because most of them used as a prefilter is imported in Korea. However, they are faced with much difficulty such as characterization of membrane and controlling of pore size on development. In this study, a microfiltration membrane developed by a company was evaluated for applicability to use as a prefilter before reverse osmosis membrane process in production of ultra pure water. The optimum feed pressure for the raw water was obtained at 0.2 to 0.4 atm. At that time, turbidity of the treated water was 0.4 NTU and flux was 6,000 to $9,000L/m^2/hr$. In case of the conventionally treated water, it showed the very stable flux and turbidity at 90% of recovery rate. The chemical cleaning was helpful to reduce the TMP for treated water. The turbidity was improved from 0.3 NTU to 0.1 NTU after chemical cleaning.

• Proceedings of the IEEK Conference
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• 2001.10a
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• pp.415-420
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• 2001

Water usage in the semiconductor industries is dramatically increased by not only using bigger wafer from 8 inches to 12 inches but also by adapting new process such as Chemical Mechanical Planarization (CMP) process invented by IBM in late '80. However, The document published by International Semiconductor Association suggests the decreasing ultra pure water (UPW) use from 22 gallon/in$^2$in 1997 to 5 gallon/in$^2$ in 2012. The criteria will possibly used as exporting obstacle in the future. Generally, Solid content of CMP slurry is about 15wt%. The slurry is diluted with UPW before fed to a CMP process. When the slurry is discharged from the process as waste, it contains 0.1~0.6wt% of solid content and 9~10 at pH. The CMP waste slurry is discharged to stream with minimum treatment. In this study, to find optimum condition of coagulation for water recovery from the waste CMP slurry various condition of coagulation were examined. After coagulation far 0.1 wt% solid content of waste CMP slurry, the sludge volume was 10~15% after 30 min of sedimentation time. For the 0.5 wt%, sludge volume was 50~55% after one hour of sedimentation time. For more than 80% of water recycling, the solid content should be in the range of 0.1 to 0.2wr%. Based on the result of the turbidity removal, the Zeta Potential and the analysis of heavy metals, the optimum condition for 0.1 wr% of waste CMP slurry was with 20 mg/L of PACI at 4 to 5 of pH. The result showed that the optimum conditions fer the 0.1 wt% waste CMP slurry were 100mg/L of Alum at 4~5 of pH, 100 mg/L of MgCI$_2$at pH 10 to 11 and 100 mg/L of Ca(OH)$_2$at pH 9 to 11, respectively.