• Title/Summary/Keyword: transistor

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A X-band 40W AlGaN/GaN Power Amplifier MMIC for Radar Applications (레이더 응용을 위한 X-대역 40W AlGaN/GaN 전력 증폭기 MMIC)

  • Byeong-Ok, Lim;Joo-Seoc, Go;Keun-Kwan, Ryu;Sung-Chan, Kim
    • Journal of IKEEE
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    • v.26 no.4
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    • pp.722-727
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    • 2022
  • In this paper, we present the design and characterization of a power amplifier (PA) monolithic microwave integrated circuit (MMIC) in the X-band. The device is designed using a 0.25 ㎛ gate length AlGaN/GaN high electron mobility transistor (HEMT) on SiC process. The developed X-band AlGaN/GaN power amplifier MMIC achieves small signal gain of over 21.6 dB and output power more than 46.11 dBm (40.83 W) in the entire band of 9 GHz to 10 GHz. Its power added efficiency (PAE) is 43.09% ~ 44.47% and the chip dimensions are 3.6 mm × 4.3 mm. The generated output power density is 2.69 W/mm2. It seems that the developed AlGaN/GaN power amplifier MMIC could be applicable to various X-band radar systems operating X-band.

Introduction to System Modeling and Verification of Digital Phase-Locked Loop (디지털 위상고정루프의 시스템 모델링 및 검증 방법 소개)

  • Shinwoong, Kim
    • Journal of IKEEE
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    • v.26 no.4
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    • pp.577-583
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    • 2022
  • Verilog-HDL-based modeling can be performed to confirm the fast operation characteristics after setting the design parameters of each block considering the stability of the system by performing linear phase-domain modeling on the phase-locked loop. This paper proposed Verilog-HDL modeling including DCO noise and DTC nonlinear characteristic. After completing the modeling, the time-domain transient simulation can be performed to check the feasibility and the functionality of the proposed PLL system, then the phase noise result from the system design based on the functional model can be verified comparing with the ideal phase noise graph. As a result of the comparison of simulation time (6 us), the Verilog-HDL-based modeling method (1.43 second) showed 484 times faster than the analog transistor level design (692 second) implemented by TSMC 0.18-㎛.

Development of 200kW class electric vehicle traction motor driver based on SiC MOSFET (SiC MOSFET기반 200kW급 전기차 구동용 모터드라이버 개발)

  • Yeonwoo, Kim;Sehwan, Kim;Minjae, Kim;Uihyung, Yi;Sungwon, Lee
    • Journal of IKEEE
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    • v.26 no.4
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    • pp.671-680
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    • 2022
  • In this paper, A 200kW traction motor driver that covers most of the traction motor specification of commercial electric vehicles (EV) is developed. In order to achieve high efficiency and high power density, a next-generation power semiconductors (Silicon carbide, SiC) are applied instead of power semiconductor(IGBT), which is Si based. Through hardware analysis for optimal use of SiC, expected efficiency and heat dissipation characteristics are obtained. A vector control algorithm for an IPMSM (Interior permanent magnet synchronous motor), which is mostly used in EV(Electric vehicle) traction motor, is implemented using DSP (Digital signal processor). In this paper, a prototype traction motor driver based SiC for EV is designed and manufactured, and its performance is verified through experiments.

High Power W-band Power Amplifier using GaN/Si-based 60nm process (GaN/Si 기반 60nm 공정을 이용한 고출력 W대역 전력증폭기)

  • Hwang, Ji-Hye;Kim, Ki-Jin;Kim, Wan-Sik;Han, Jae-Sub;Kim, Min-Gi;Kang, Bong-Mo;Kim, Ki-chul;Choi, Jeung-Won;Park, Ju-man
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.22 no.4
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    • pp.67-72
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    • 2022
  • This study presents the design of power amplifier (PA) in 60 nm GaN/Si HEMT technology. A customized transistor model enables the designing circuits operating at W-band. The all matching network of the PA was composed of equivalent transformer circuit to reduce matching loss. And then, equivalent transformer is several advantages without any additional inductive devices so that a wideband power characteristic can be achieved. The designed die area is 3900 ㎛ × 2300 ㎛. The designed results at center frequency achieved the small signal gain of 15.9 dB, the saturated output power (Psat) of 29.9 dBm, and the power added efficiency (PAE) of 24.2% at the supply voltage of 12 V.

Cost-Effective Soft Lithography of Organic Semiconductors in OFETs with Compact Discs as Master Molds (Compact Disc를 마스터 몰드로 사용하는 저비용의 OFET용 유기반도체 소프트 리소그래피)

  • Sejin Park;Hyukjin Kim;Tae Kyu An
    • Journal of Adhesion and Interface
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    • v.23 no.4
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    • pp.116-121
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    • 2022
  • OFET have require fine patterning technology for organic semiconductor solution process to be used in actual electronics. In this study, we compared and analyzed the soft lithography method which can form fine patterns more than the conventional spin coating method in order to confirm that it can have better electrical characteristics. The soft lithography method produced a flexible master mold using nano patterns on compact disc surfaces and obtained a 650 nm wide 2,7-Dioctyl [1] benzothieno [3,2-b] [1] benzo thiophene (C8-BTBT) nanowires. As a result, the field-effect mobility of devices fabricated by the spin coating method was 0.0036 cm2/Vs and mobility of devices produced by soft lithography method was 0.086 cm2/Vs, which was about 20 times higher than spin-coated devices and has better electrical performance.

Radiation Resistance Evaluation of Thin Film Transistors (박막트랜지스터의 방사선 내구성 평가)

  • Seung Ik Jun;Bong Goo Lee
    • Journal of the Korean Society of Radiology
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    • v.17 no.4
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    • pp.625-631
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    • 2023
  • The important requirement of industrial dynamic X-ray detector operating under high tube voltage up to 450 kVp for 24 hours and 7 days is to obtain significantly high radiation resistance. This study presents the radiation resistance characteristics of various thin film transistors (TFTs) with a-Si, poly-Si and IGZO semiconducting layers. IGZO TFT offering dozens of times higher field effect mobility than a-Si TFT was processed with highly hydrogenated plasma in between IGZO semiconducting layer and inter-layered dielectric. The hydrogenated IGZO TFT showed most sustainable radiation resistance up to 10,000Gy accumulated, thus, concluded that it is a sole switching device in X-ray imaging sensor offering dynamic X-ray imaging at high frame rate under extremely severe radiation environment such as automated X-ray inspection.

Electronic properties of graphene nanoribbons with Stone-Wales defects using the tight-binding method

  • M.W. Chuan;S.Z. Lok;A. Hamzah;N.E. Alias;S. Mohamed Sultan;C.S. Lim;M.L.P Tan
    • Advances in nano research
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    • v.14 no.1
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    • pp.1-15
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    • 2023
  • Driven by the scaling down of transistor node technology, graphene became of interest to many researchers following the success of its fabrication as graphene nanoribbons (GNRs). However, during the fabrication of GNRs, it is not uncommon to have defects within the GNR structures. Scaling down node technology also changes the modelling approach from the classical Boltzmann transport equation to the quantum transport theory because the quantum confinement effects become significant at sub-10 nanometer dimensions. The aim of this study is to examine the effect of Stone-Wales defects on the electronic properties of GNRs using a tight-binding model, based on Non-Equilibrium Green's Function (NEGF) via numeric computation methods using MATLAB. Armchair and zigzag edge defects are also implemented in the GNR structures to mimic the practical fabrication process. Electronic properties of pristine and defected GNRs of various lengths and widths were computed, including their band structure and density of states (DOS). The results show that Stone-Wales defects cause fluctuation in the band structure and increase the bandgap values for both armchair GNRs (AGNRs) and zigzag GNRs (ZGNRs) at every simulated width. In addition, Stone-Wales defects reduce the numerical computation DOS for both AGNRs and ZGNRs. However, when the lengths of the structures increase with fixed widths, the effect of the Stone-Wales defects become less significant.

Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process

  • Byoung-Gue Min;Jong-Min Lee;Hyung Sup Yoon;Woo-Jin Chang;Jong-Yul Park;Dong Min Kang;Sung-Jae Chang;Hyun-Wook Jung
    • ETRI Journal
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    • v.45 no.1
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    • pp.171-179
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    • 2023
  • We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13㎛-0.16㎛ to suit the intended application. The core processes are a two-step electron-beam lithography process using a three-layer resist and gate recess etching process using citric acid. An electron-beam lithography process was developed to fabricate a T-shaped gate electrode with a fine gate foot and a relatively large gate head. This was realized through the use of three-layered resist and two-step electron beam exposure and development. Citric acid-based gate recess etching is a wet etching, so it is very important to secure etching uniformity and process reproducibility. The device layout was designed by considering the electrochemical reaction involved in recess etching, and a reproducible gate recess etching process was developed by finding optimized etching conditions. Using the developed gate electrode process technology, we were able to successfully manufacture various monolithic microwave integrated circuits, including low noise amplifiers that can be used in the 28 GHz to 94 GHz frequency range.

High Efficiency Power Amplifier applied to 5G Systems (5G 시스템에 적용되는 고효율 전력증폭기)

  • Young Kim
    • Journal of Advanced Navigation Technology
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    • v.27 no.2
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    • pp.197-202
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    • 2023
  • This paper presents the design method and electrical characteristics of a high-efficiency power amplifier for a 50 Watts class repeater applied to a 5G system and used in in-building, subway, and tunnel. GaN was used for the termination transistor of the power amplifier designed here, and intermodulation signals were removed using DPD to satisfy linearity. In addition, in order to handle various requirements such as amplifier gain control and alarm processing required in the 5G system, the microprocessor is designed to exist inside the power amplifier. The amplifier manufactured to confirm the electrical performance of the power amplifier satisfying these conditions satisfied 46.5 dBm and the overall efficiency of the amplifier was 37%, and it was confirmed that it satisfied various alarm conditions and electrical characteristics required by telecommunication companies.

A Study on Contact Resistance Properties of Metal/CVD Graphene (화학기상증착법을 이용하여 합성한 그래핀과 금속의 접촉저항 특성 연구)

  • Dong Yeong Kim;Haneul Jeong;Sang Hyun Lee
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.60-64
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    • 2023
  • In this study, the electrical contact resistance characteristics between graphene and metals, which is one of important factors for the performance of graphene-based devices, were compared. High-quality graphene was synthesized by chemical vapor deposition (CVD) method, and Al, Cu, Ni, and Ti as electrode materials were deposited on the graphene surface with equal thickness of 50 nm. The contact resistances of graphene transferred to SiO2/Si substrates and metals were measured by the transfer length method (TLM), and the average contact resistances of Al, Cu, Ni, and Ti were found to be 345 Ω, 553 Ω, 110 Ω, and 174 Ω, respectively. It was found that Ni and Ti, which form chemical bonds with graphene, have relatively lower contact resistances compared to Al and Cu, which have physical adsorption properties. The results of this study on the electrical properties between graphene and metals are expected to contribute to the realization of high-performance graphene-based devices including electronics, optoelectronic devices, and sensors by forming low contact resistance with electrodes.