• Transactions of the Korean hydrogen and new energy society
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• v.5 no.1
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• pp.41-49
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• 1994

Ti-Bi alloy was prepared by arc melting of appropriate amounts of titanium and bismuth powder. The photocurrent($I_{ph}$) of Ti-Bi oxide electrode was increased with the increase of Bi content, up to 10wt%. The maximum $I_{ph}$ showed $7.6mA/cm^2$ at V=0.5V vs. SCE. The band gap energy of Ti-Bi oxide electrode was observed to 3.0~2.87eV. Surface barrier($V_s$) of Ti-10Bi oxide electrode showed maximum value(1.08V) but didn't exceed 1.23V, then it was impossible to run $H_2$ generation without any other energy sources other than the light. Ti-Bi oxide electrode was found to be quite stable under alkaline solution and showed no signs of photodecomposition.

• Journal of Powder Materials
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• v.25 no.4
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• pp.327-330
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• 2018

This study is conducted as a preliminary research to verify the feasibility of Ti-based Oxide dispersion strengthened (ODS) alloy. Pure-Ti powder is mixed with $Y_2O_3$ powder and subsequently, mechanically alloyed at $-150^{\circ}C$. The Ti-based ODS powder is hot-isostatically pressed and subsequently hot-rolled for recrystallization. The microstructure consists of elongated grains and Y excess fine particles. The oxide particle size is larger than that of the typical Fe-based ODS steel. Tensile test shows that the tensile ductility is approximately 25%, while the strength is significantly higher than that of pure Ti. The high-temperature hardness of the Ti-ODS alloy is also significantly higher than that of pure Ti at all temperatures, while being lower than that of Ti-6Al-4V. The dimple structure is well developed, and no evidence of cleavage fracture surface is observed in the fracture surface of the tensile specimen.

• Transactions on Electrical and Electronic Materials
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• v.11 no.1
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• pp.1-10
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• 2010

This is an overview paper reporting our most recent work on processing and microstructure of nano-structured oxides and their photoluminescence and photo-catalysis properties. Zinc oxide and related transition metal oxides such as vanadium pentoxide and titanium dioxide were produced by a combination of magnetron sputtering, hydrothermal growth and atmosphere controlled heat treatment. Special morphology and microstructure were created including nanorods arrays, core-brushes, nano-lollipops and multilayers with very large surface area. These structures showed special properties such as much enhanced photoluminescence and chemical reactivity. The photo-catalytic properties have also been promoted significantly. It is believed that two factors contributed to the high reactivity: the large surface area and the interaction between different oxides. The transition metal oxides with different band gaps have much enhanced photoluminescence under laser stimulation. Use of these complex oxide structures as electrodes can also improve the energy conversion efficiency of solar cells. The mixed oxide complex may provide a promising way to high-efficiency photo emitting materials and photo-catalysts.

• The Journal of Advanced Prosthodontics
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• v.3 no.2
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• pp.63-68
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• 2011

PURPOSE. The object of this study was to investigate the effect of UV irradiation (by a general commercial UV sterilizer) on anodized titanium surface. Surface characteristics and cellular responses were compared between anodized titanium discs and UV irradiated anodized titanium discs. MATERIALS AND METHODS. Titanium discs were anodized and divided into the following groups: Group 1, anodized (control), and Goup 2, anodized and UV irradiated for 24 hours. The surface characteristics including contact angle, roughness, phase of oxide layer, and chemical elemental composition were inspected. The osteoblast-like human osteogenic sarcoma (HOS) cells were cultured on control and test group discs. Initial cellular attachment, MTS-based cell proliferation assay, and ALP synthesis level were compared between the two groups for the evaluation of cellular response. RESULTS. After UV irradiation, the contact angle decreased significantly (P<.001). The surface roughness and phase of oxide layer did not show definite changes, but carbon showed a considerable decrease after UV irradiation. Initial cell attachment was increased in test group (P=.004). Cells cultured on test group samples proliferated more actively (P=.009 at day 2, 5, and 7) and the ALP synthesis also increased in cells cultured on the test group (P=.016 at day 3, P=.009 at day 7 and 14). CONCLUSION. UV irradiation induced enhanced wettability, and increased initial cellular responses of HOS cells on anodized titanium surface.

• Korean Journal of Materials Research
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• v.34 no.5
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• pp.254-260
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• 2024

This study is to manufacture a titanium dioxide (TiO₂) photocatalyst by recycling sludge generated using titanium tetrachloride (TiCl₄) as a coagulant. Compared to general sewage, a TiCl₄ coagulant was applied to dyeing wastewater containing a large amount of non-degradable organic compounds to evaluate its performance. Then the generated sludge was dried and fired to prepare a photocatalyst (TFS). Scanning electron microscope-energy dispersive X-ray spectroscopy (SEM-EDX), X-ray diffraction (XRD), and nitrogen oxide reduction experiments were conducted to analyze the surface properties and evaluate the photoactive ability of the prepared TFS. After using titanium tetrachloride (TiCl₄) as a coagulant in the dyeing wastewater, the water quality characteristics were measured at 84 mg/L of chemical oxygen demand (COD), 10 mg/L of T-N, and 0.9 mg/L of T-P to satisfy the discharge water quality standards. The surface properties of the TFS were investigated and the anatase crystal structure was observed. It was confirmed that the ratio of Ti and O, the main components of TiO₂, accounted for more than 90 %. As a result of the nitric oxide (NO) reduction experiment, 1.56 uMol of NO was reduced to confirm a removal rate of 20.60 %. This is judged to be a photocatalytic performance similar to that of the existing P-25. Therefore, by applying TiCl₄ to the dyeing wastewater, it is possible to solve the problems of the existing coagulant and to reduce the amount of carbon dioxide generated, using an eco-friendly sludge treatment method. In addition, it is believed that environmental and economic advantages can be obtained by manufacturing TiO₂ at an eco-friendly and lower cost than before.

• Korean Journal of Materials Research
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• v.3 no.6
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• pp.638-644
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• 1993

The degradation of dielectric breakdown field of 8nm-thick gate oxide ($SiO_2$) for Tipolycide MOS(meta1-oxide-semiconductor) capacitor with different annealing conditions and thickness of the polysilicon film on gate oxide was investigated. The degree of degradation in dielectric breakdown strength of the gate oxide for Ti-polycide gate became more severe with increasing annealing temperature and time, especially, for the case that thickness of the polysilicon film remained on the gate oxide after silicidation was reduced. The gate oxide degradation may be occurred by annealing although there is no direct contact of Ti-silicide with gate oxide. From SIMS analysis, it was confirmed that the degration of gate oxide during annealing was due to the diffusion of titanium atoms into the gate oxide film through polysilicon from the titanium silicide film.

• Journal of Korea Foundry Society
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• v.20 no.4
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• pp.247-253
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• 2000

Titanium was melted in the CaO-coated alumina crucible and the reaction between the melt and the coating layer was negligible. The volume fraction of the gas porosity was decreased with increasing pressure and the sound bar castings with no porosity was obtained under the Ar atmosphere of the pressure of $300kN/mm^2$. The surface of the casting obtained from CaO-coated graphite mold was slightly rougher than that from graphite without coating. The reaction product of titanium melt with the layer of CaO was mainly titanium oxide and that with graphite crucible was titanium cabide with small amount of titanium nitride.

• Proceedings of the IEEK Conference
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• 2000.11b
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• pp.41-44
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• 2000

Ultra large scale integrated circuit(ULSI) & complementary metal oxide semiconductor(CMOS) circuits require gate electrode materials such as meta] silicides, titanium-silicide for gate oxides. Many previous authors have researched the improvements sub-micron gate oxide quality. However, little has been done on the electrical quality and reliability of ultra thin gates. In this research, we recommend novel shallow trench isolation structure and two step TiSi$_{2}$ formation for sub 0.1${\mu}{\textrm}{m}$ gate oxide.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.33-33
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• 2003

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2003.10a
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• pp.56-56
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• 2003