• Wind and Structures
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• 제23권4호
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• pp.275-300
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• 2016

Synchronous multi-pressure measurements were carried out with relatively long time duration for a double-layer reticulated shell roof model in the atmospheric boundary layer wind tunnel. Since the long roof is open at two ends for the storage of coal piles, three different testing cases were considered as the empty roof without coal piles (Case A), half coal piles inside (Case B) and full coal piles inside (Case C). Based on the wind tunnel test results, non-Gaussian time-dependent statistics of net wind pressure on the shell roof were quantified in terms of skewness and kurtosis. It was found that the direct statistical estimation of high-order moments and peak factors is quite sensitive to the duration of wind pressure time-history data. The maximum value of COVs (Coefficients of variations) of high-order moments is up to 1.05 for several measured pressure processes. The Mixture distribution models are proposed for better modeling the distribution of a parent pressure process. With the aid of mixture parent distribution models, the existing translated-peak-process (TPP) method has been revised and improved in the estimation of non-Gaussian peak factors. Finally, non-Gaussian peak factors of wind pressure, particularly for those observed hardening pressure process, were calculated by employing various state-of-the-art methods and compared to the direct statistical analysis of the measured long-duration wind pressure data. The estimated non-Gaussian peak factors for a hardening pressure process at the leading edge of the roof were varying from 3.6229, 3.3693 to 3.3416 corresponding to three different cases of A, B and C.

• Korean Chemical Engineering Research
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• 제57권2호
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• pp.210-218
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• 2019

실로퓨트를 이용한 식물세포 Taxus chinensis 유래 주요 타르성분인 2-피콜린 흡착 실험을 수행하였다. 2-피콜린 초기농도, 흡착 온도 및 시간을 달리한 회분식 흡착 평형 데이터를 Langmuir, Freundlich, Temkin, Dubinin-Radushkevich 등온흡착식에 적용하였다. 실로퓨트를 이용한 2-피콜린의 흡착은 Langmuir 흡착등온식에 가장 적합함을 알 수 있었다. 흡착온도가 증가함에 따라 흡착용량이 감소하는 경향을 보였으며 실로퓨트를 이용한 2-피콜린 흡착 공정이 적합함을 알 수 있었다. 동역학적 해석을 통하여 본 흡착 공정은 유사 이차 반응속도식에 잘 따름을 알 수 있었으며, 입자 내 확산과 경계층 확산이 율속 단계에 거의 영향을 미치지 않았다. 열역학적 해석을 통해 흡착 과정이 발열이며, 비가역적 비자발적으로 수행되었다. 흡착량이 증가함에 따라 등량흡착열은 감소하는 경향을 보여 흡착제의 표면 에너지가 불균일함을 알 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.221-221
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• 2014

The present work proposes an improved numerical simulator for design and modification of large area capacitively coupled plasma (CCP) processing chamber. CCP, as notoriously well-known, demands the tremendously huge computational cost for carrying out transient analyses in realistic multi-dimensional models, because electron dissociations take place in a much smaller time scale (${\Delta}t{\approx}10-8{\sim}10-10$) than time scale of those happened between neutrals (${\Delta}t{\approx}10-1{\sim}10-3$), due to the rf drive frequencies of external electric field. And also, for spatial discretization of electron flux (Je), exponential scheme such as Scharfetter-Gummel method needs to be used in order to alleviate the numerical stiffness and resolve exponential change of spatial distribution of electron temperature (Te) and electron number density (Ne) in the vicinity of electrodes. Due to such computational intractability, it is prohibited to simulate CCP deposition in a three-dimension within acceptable calculation runtimes (<24 h). Under the situation where process conditions require thickness non-uniformity below 5%, however, detailed flow features of reactive gases induced from three-dimensional geometric effects such as gas distribution through the perforated plates (showerhead) should be considered. Without considering plasma chemistry, we therefore simulated flow, temperature and species fields in three-dimensional geometry first, and then, based on that data, boundary conditions of two-dimensional plasma discharge model are set. In the particular case of SiH4-NH3-N2-He CCP discharge to produce deposition of SiNxHy thin film, a cylindrical showerhead electrode reactor was studied by numerical modeling of mass, momentum and energy transports for charged particles in an axi-symmetric geometry. By solving transport equations of electron and radicals simultaneously, we observed that the way how source gases are consumed in the non-isothermal flow field and such consequences on active species production were outlined as playing the leading parts in the processes. As an example of application of the model for the prediction of the deposited thickness uniformity in a 300 mm wafer plasma processing chamber, the results were compared with the experimentally measured deposition profiles along the radius of the wafer varying inter-electrode gap. The simulation results were in good agreement with experimental data.