• 제목/요약/키워드: surface size

검색결과 7,381건 처리시간 0.037초

엔드밀 가공시 공구변형을 고려한 표면형성 해석 (Surface Generation in End Milling considering Tool Deflection)

  • 이상규
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1996년도 춘계학술대회 논문집
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    • pp.119-124
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    • 1996
  • End milling operation is very important in machining precision components. Deterioration of surface roughness and surface geometry will cause more process for surface finishing. According to the feed rate and the cutting edge geometry, the cusp which is geometrically uncut surface is determined. To reduce the cost for dinishing operation after end milling, the cusp must be remaianed in small size as possible. Due to the cylindrical type of the end mill, tool deflection is one of the main problems in surface generation. The cutting resistance and the rigidity of the end mill will determine the size of tool deflection. One more important factor which deteriorate surface quality comes from the error in manufacturing end mills. Run-out of end mill which is the difference of the radius of each cutting edges will produce the difference of the cusp size in every rotation of end mill. These three major factors to the surface quality will be analized and the result will be compared with experimental ressult.

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Estimation of the Substrate Size with Minimum Mutual Coupling of a Linear Microstrip Patch Antenna Array Positioned Along the H-Plane

  • Kwak, Eun-Hyuk;Yoon, Young-Min;Kim, Boo-Gyoun
    • Journal of Electrical Engineering and Technology
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    • 제10권1호
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    • pp.320-324
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    • 2015
  • Mutual coupling between antenna elements of a linear microstrip patch antenna array positioned along the H-plane including the effect of edge reflections is investigated. Simple formulas are presented for the estimation of the grounded dielectric substrate size with minimum mutual coupling. The substrate sizes calculated by these formulas are in good agreement with those obtained by the full-wave simulation and experimental measurement. The substrate size with minimum mutual coupling is a function of the effective dielectric constant for surface waves and the distance between the antenna centers. The substrate size with minimum mutual coupling decreases as the effective dielectric constant for surface waves on a finite grounded dielectric substrate increases.

레이저 표면경화처리에서 빔의 형태가 경화층 크기에 미치는 영향에 관한 연구 (A Study on the Effect of Beam Mode on the Size of Hardened Zone in Laser Surface Hardening)

  • Kim, J.W.
    • 한국정밀공학회지
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    • 제10권4호
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    • pp.64-72
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    • 1993
  • Analytical models for the prediction of the size of hardened zone in laser surface hardening are presented. The models are based on the solutions to the problem of three-dimensional heat flow in plates with infinite thickness. The validity of the model was tested on medium carbon steel for Gaussian mode of beam. Then the model for rectagular beam was used for the predicition of the size of hardened zone on various hardening process parameters. From the calculation results it appeared that the size and shape of the hardened zone are strongly dependent on process parameters such as beam mode, beam size, and traverse speed.

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아르곤 플라즈마처리에 의한 다결정 $Si_{1-x}Ge_x$박막의 표면거칠기 개선 (The Improvement of Surface Roughness of Poly-$Si_{1-x}Ge_x$Thin Film Using Ar Plasma Treatment)

  • 이승호;소명기
    • 한국세라믹학회지
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    • 제34권11호
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    • pp.1121-1128
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    • 1997
  • In this study, the Ar plasma treatment was used to improve the surface roughness of Poly-Si1-xGex thin film deposited by RTCVD. The surface roughness and the resistivity of Si1-xGex thin film were investigated with variation of Ar plasma treatment parameters (electrode distance, working pressure, time, substrate temperature and R.F power). When the Ar plasma treatment was used, the cluster size decreased by the surface etching effect due to the increasing surface collision energy of particles (ion, neutral atom) in plasma under the conditions of decreasing electrode distance and increasing pressure, time, temperature, and R. F power. Although the surface roughness value decreased by the reduction of the cluster size due to surface etching effect, however, the resistivity increased. This may be due to the surface damage caused by the increasing surface collision energy. It was concluded that the surface roughness could be improved by the Ar plasma treatment, while the resistivity was increased by the surface damage on the substrate.

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S45C강의 고주파 열처리 표면경화재 피로한도 예측에 관한 연구 (The Study on Estimation Fatigue Limit in Induction Surface Hardened S45C Steel)

  • 이수진;전형용;성낙원
    • 한국자동차공학회논문집
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    • 제6권1호
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    • pp.134-142
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    • 1998
  • The effects of small hole defect size and effective case depth(ECD) on the four point bending fatigue limit of induction surface hardened S45C steel were investigated the fatigue limit evaluation of hardened materials is very difficult because of relations of the hardness gradient and residual stress. In this study, it was possible to characterize fatigue limit and fatigue life of induction surface hardened S45C steel in terms of the hole defect size and effective case depth(ECD) and quantitative evaluation of the fatigue limit with hole defects use Murakami's evaluation method and the range of evaluated values is a good accuracy compared with results.

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An innovative CAD-based simulation of ball-end milling in microscale

  • Vakondios, Dimitrios G.;Kyratsis, Panagiotis
    • Advances in Computational Design
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    • 제5권1호
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    • pp.13-34
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    • 2020
  • As small size and complex metal machining components demand increases, cutting processes in microscale become necessary. Ball-end milling is a commonly used finishing process, which nowadays can be applied in the microscale size. Surface quality and dimensional accuracy are two basic parameters that affect small size components in their assembly and functionality. Thus, good quality can be achieved by optimizing the cutting conditions of the procedure. This study presents a 3D simulation model of ball-end milling in microscale developed in a commercial CAD software and its optical and computing results. These carried out results are resumed to surface topomorphy, surface roughness, chip geometry and cutting forces calculations that arising during the cutting process. A great number of simulations were performed in a milling machine centre, applying the discretized kinematics of the procedure and the final results were compared with measurements of Al7075-T651 experiments.

구리 박막 제조중 증착 중단시 박막 결정립 크기 변화가 인장응력 방향으로의 응력 이동에 미치는 영향 (The Effect of Grain Size on the Stress Shift toward Tensile Side by Deposition Interruptions in Copper Thin Films)

  • 이세리;오승근;김영만
    • 한국표면공학회지
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    • 제47권6호
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    • pp.303-310
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    • 2014
  • In this study, the average in-situ stress in metallic thin film was measured during deposition of the Cu thin films on the Si(111) wafer and then the phenomenon of stress shift by the interruption of deposition was measured using Cu thin films. We have observed the stress shift in accordance with changing amount of atom's movement between the surface and grain boundary through altering the grain size of the Cu thin film with variety of parameters. The grain size is known to be affected on the deposition rate, film thickness and deposition temperature. As a experimental results, the these parameters was not adequate to explain stress shift because these parameters affect directly on the amount of atom's movement between the surface and grain boundary as well as the grain size. Thus, we have observed the stress shift toward tensile side in accordance with the grain size changing through the interlayer deposition. From an experiment with inserting interlayer before deposit Cu, in thin film which has big grain size with high roughness, amount of stress movement is higher along direction of tensile stress after deposition that means, after deposition process, driving force of atoms moving in grain boundary and on the surface of the film is relatively higher than before.

Y-TZP zirconia의 기계적 표면처리가 파절저항과 접착계면 실패에 미치는 영향 (Effect of mechanical surface treatment on the fracture resistance and interfacial bonding failure of Y-TZP zirconia)

  • 이양진
    • 구강회복응용과학지
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    • 제30권2호
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    • pp.102-111
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    • 2014
  • 목적: 본 연구의 목적은 air-blasting particle size를 달리하고 분사 압력과 시간을 통상보다 크게 증가시켜 표면에 큰 손상을 유발한 군을 상대적으로 작은 손상을 유발한 군과 비교하여 파절 저항과 접착 강도 차이를 보이는지 평가하는 데 있다. 연구 재료 및 방법: 지르코니아($LAVA^{TM}$) 디스크 표면에 각각 $30{\mu}m$- particle size (Cojet) 2.8 bar 15초, $110{\mu}m$- (Rocatec) 2.8 bar 15초, $110{\mu}m$- (Rocatec) 3.8 bar 30초로 조건을 달리하여 표면처리 후 각각 이축 굽힘하중 강도 실험과 접착 파절 하중 실험을 실행하였다. 접착은 상아질 유사 베이스에 $200{\mu}m$ 두께의 레진시멘트로 시행하여 인장력을 극대화하였으며 음향방출(AE) 센서로 실패하중을 검출하였다. 결과: 이축 굽힘하중 강도, 접착 파절하중은 세 군간 서로 유의성 있는 차이를 보이지 않았다(P > 0.05). 접착 시편의 균열은 대부분 radial crack이었다. 결론: 정하중 평가의 한계 내에서, air-blasting particle size와 압력에 의한 표면 손상은 크지 않았으며, 접착 파절하중 평가는 표면 손상과 접착 강도를 동시에 평가할 수 있는 방법이라 여겨진다.

비수계 염색용 마이크로캡슐의 제조 및 성질 (Preparation and Characterization of Microcapsule for non-aqueous dyeing)

  • 최창남;박원규;변수진;이기영
    • 한국염색가공학회지
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    • 제15권5호
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    • pp.327-332
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    • 2003
  • In this study, the polyurethane microcapsules for non-aqueous dyeing containing iron oxide and disperse dyes were prepared by in-situ polymerization method using hexamethylene diisocyanate(HDI) with ethylene glycol(EG). And the size, shape, and particle size distribution of microcapsules prepared were investigated. The size and shape of microcapsule were observed by optical microscope and scanning elecron microscope. The particle size distribution was analyzed by particle size analyzer. The microcapsule size and its distribution were largely effected by the existance of surface active agent in the system. When a surfactant did not exist in the system, the size distribution of microcapsules prepared was much uneven. By adding a surfactant, this phenomenon was disappeared. And the size of microcapsule was also effeced by the hydrophobicity of core material(disperse dye). It was considered due to the difference of dispersity of core materials. And the size of microcapsule prepared was inversely proportional to the stirring speed.

Gallium Nitride 기판의 Mechanical Polishing시 다이아몬드 입자 크기에 따른 표면 Morphology의 변화 (Influence of the Diamond Abrasive Size during Mechanical Polishing Process on the Surface Morphology of Gallium Nitride Substrate)

  • 김경준;정진석;장학진;신현민;정해도
    • 한국정밀공학회지
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    • 제25권9호
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    • pp.32-37
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    • 2008
  • Freestanding hydride vapor phase epitaxy grown GaN(Gallium Nitride) substrates subjected to various polishing methods were characterized for their surface and subsurface conditions, Although CMP(Chemical Mechanical Polishing) is one of the best approaches for reducing scratches and subsurface damages, the removal rate of Ga-polar surface in CMP is insignificant($0.1{\sim}0.3{\mu}m$/hr) as compared with that of N-polar surface, Therefore, conventional MP(Mechanical Polishing) is commonly used in the GaN substrate fabrication process, MP of (0001) surface of GaN has been demonstrated using diamond slurries with different abrasive sizes, Diamond abrasives of size ranging from 30nm to 100nm were dispersed in ethylene glycol solutions and mineral oil solutions, respectively. Significant change in the surface roughness ($R_a$ 0.15nm) and scratch-free surface were obtained by diamond slurry of 30nm in mean abrasive size dispersed in mineral oil solutions. However, MP process introduced subsurface damages confirmed by TEM (Transmission Electronic Microscope) and PL(Photo-Luminescence) analysis.