• 방사성폐기물학회지
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• 제19권1호
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• pp.123-132
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• 2021

Radiological impact analyses were carried out for a near-surface radioactive waste repository at Gyeongju in South Korea. The RESRAD-ONSITE code was applied for the estimation of maximum exposure doses by considering various exposure pathways based on a land area of 2,500 ㎡ with a 0.15 m thick contamination zone. Typical influencing input parameters such as shield depth, shield materials' density, and shield erosion rate were examined for a sensitivity analysis. Then both residential farmer and industrial worker scenarios were used for the estimation of maximum exposure doses depending on exposure duration. The radiation dose evaluation results showed that 60Co, 137Cs, and 63Ni were major contributors to the total exposure dose compared with other radionuclides. Furthermore, the total exposure dose from ingestion (plant, meat, and milk) of the contaminated plants was more significant than those assessed for inhalation, with maximum values of 5.5×10-4 mSv·yr-1 for the plant ingestion. Thus the results of this study can be applied for determining near-surface radioactive waste repository conditions and providing quantitative analysis methods using RESRAD-ONSITE code for the safety assessment of disposing radioactive materials including decommissioning wastes to protect human health and the environment.

• 한국전기전자재료학회논문지
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• 제15권8호
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• pp.726-730
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• 2002

Electro-optical (EO) performances of the ion beam (IB) aligned twisted-nematic (TN)-liquid crystal display (LCD) with ion beam exposure on the new diamond-like carbon (DLC) thin film surface were investigated. A good voltage-transmittance (V-T) curve of the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min was observed. Also, the fast response time of the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved. Finally, the residual DC voltage of the ion beam aligned TN-LCD on the DLC thin film surface is almost the same as that of the rubbing aligned TN-LCD on a polyimide (Pl) surface.

• Spatial Information Research
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• 제19권1호
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• pp.13-19
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• 2011

도시화가 진행됨에 띠라 고층아파트와 고층빌딩 등 지형지물의 변화가 많이 일어나고 있다. 지형지물의 변화는 강풍 발생의 원인으로 작용하며, 풍속은 풍상측 지형지물의 영향으로 같은 속도의 바람이 붙어올지라도 그 값이 증가 또는 감소한다. 설계기준에서는 이러한 변화를 풍속고도분포계수로 정의하고, 지표면조도에 따라 그 값을 산정하여 반영하도록 하고 있지만 현실에서는 설계자의 주관적 판단에 따라 지표면조도를 결정하야 풍속고도분포계수를 산정하고 있으며, 건설지점의 지표면조도를 구분하기 위한 연구와 자료 또한 부족한 실정이다. 본 논문에서든 최근 고층주거건물이 많이 건설된 지역을 대상으로 건축물의 수직높이에 따분 지표면조도를 GIS프로그램을 이용하여 정량적으로 구분함으로써 풍속 고도분포계수를 보다 합리적으로 산정하고자 한다. 풍하중을 고려한 구조물 설계 시 본 연구에서 제안한 풍속고도분포계수 산정방법을 이용함으로써 설계의 합리성과 구조물의 안전성을 더 높일 수 있을 것이다.

• 대한전자공학회논문지
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• 제25권8호
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• pp.966-971
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• 1988

AES was used to study oxygen adsorption due to the oxygen exposure at 300\ulcorner temperature and segregation of impurities due to annealing on polycrystal copper surface. The intensity of peak of CuM2, 3VV and CuL3 VV increased with annealing time and the peak of CKLL increased after Ar ion bombardment. The effect of oxygen adsorption on copper surface at 300\ulcorner was verified by the decreased of peak of CuM2, 3VV and CuL3 VV as oxygen exposure increase. The binding energy of copper atoms gradualy shifts from 0.7eV to 1.5eV of copper atoms gradually shifts from 0.7eV to 1.5eV after a oxygen exposure. After the oxygen exposure, the width at half the height of CuM2, 3VV is larger 2V*C/S by the effect of chemical liaison of the copper aton with oxygen atom.

• Transactions on Electrical and Electronic Materials
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• 제3권2호
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• pp.1-5
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• 2002

Alignment effects for nematic liquid crystal (NLC) and electro-optical (EO) characteristics of the ion beam (IB) aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the diamond-like carbon (DLC) thin film surface were studied. A high pretilt angle of 3.5$^{\circ}$ in NLC by ion beam exposure on the DLC thin film layer can be measured. An excellent voltage-transmittance (V-T) curve of the ion beam aligned TN-LCD was observed with oblique ion beam exposure on the DLC thin film surface for 1 min. Also, a faster response time for the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.577-578
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• 2010

• 한국전기전자재료학회논문지
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• 제14권10호
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• pp.845-849
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• 2001

The new phto-alignment material PMI5CA, poly{N-(phenyl)maleimide-co-3-[4-(pentyloxy) cinamate]porpyl-2-hydroxy-1-methacrylate}, was synthesized and the electro-optical (EO)characteristics in the vertical-aligned(VA) liquid crystal display (LCD) photo-aligned on the photopolymer surface were studied. Excellent Voltage-transmittance(V-T) characteristics in the VA-LCD photoaligned with polarized UV exposure of oblique direction on the pohotopolymer surface for 1 min can be achieve. The transmittance of the VA-LCD photoaligned on the photopolymer surface decreased with increasing UV exposure time. We suggest that decrease of transmittance in the VA-LCD photoaligned on the photopolymer surface is attributed to the dissociation of the ester linkage in the photodimerized cinnamate structure with increasing UV exposure time.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.497-499
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• 2003

Electro-optical (EO) performances of the ion beam aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the DLC thin film surface were studied. An excellent voltage-transmittance (VT) curve of the ion beam aligned TN-LCD was observed with oblique ion beam exposure on the DLC thin film surface for 1 min. Also, a faster response time for the ion beam aligned TN-LCD can be achieved with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved.

• Transactions on Electrical and Electronic Materials
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• 제8권5호
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• pp.211-214
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• 2007

Chemical and morphological changes of phenol formaldehyde-based photoresist after $O_2$ radiofrequency(RF) plasma treatment depending on exposure time and source power were investigated. It was found that etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time. Contact angle measurements and X-ray photoelectron spectroscopy(XPS) analysis showed that the surface chemical structure become nearly constant after 15 sec of the treatment. Atomic force microprobe(AFM) measurements were shown that surface roughness was increased with plasma exposure time.

• Bulletin of the Korean Chemical Society
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• 제8권5호
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• pp.358-362
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• 1987

The interaction of oxygen with polycrystalline nickel surface has been studied by investigating the X-ray photoelectron spectra of O 1s, Ni $2p_{3/2}$, and their valence band electrons. By comparing the oxygen exposure of this work with the reported results of LEED, AES, and work function measurements, it is found that the atomic oxygen, adsorbed dissociatively in the initial stage of exposure, is responsible for a p(2 ${\times}$ 2) structure and a subsequent c(2 ${\times}$ 2) structure on the Ni(100) surface. This dissociatively adsorbed oxygen species forms surface NiO layer subsequently on further oxygen exposure. The NiO layer is more easily formed with the increasing temperature. Non-stoichiometric oxygen species is also found to accompany the NiO layer. It appears prior to the formation of bulk NiO at all of the temperatures of this work except at 523K.