• 한국표면공학회지
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• 제53권1호
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• pp.1-8
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• 2020

Sulfamate-chloride baths were fabricated to study the properties of the electrodeposited Ni and NiCo thin films. The dependences of current efficiency, deposit composition of Ni and Co, residual stress, surface morphology and microstructure of electrodeposited Ni and NiCo thin films on CoCl₂ concentration in sulfamate-chloride baths were investigated. The current efficiency was measured to be more than about 90%, independent of the changes of CoCl₂ concentration in the baths. Residual stress of Ni and NiCo thin films was increased from about 45 to about 250 MPa with varying CoCl₂ concentration from 0 to 0.210 M CoCl₂ in the baths and then reached to a plateau, about 250 MPa above 0.420 M CoCl₂ concentration. Nodular surface morphologies were observed at most CoCl₂ concentrations in the baths except 0.210 M. NiCo thin film electrodeposited from the bath with 0.210 M CoCl₂ concentration showed an acicular surface morphology. Pure Ni thin film consists of FCC(111), FCC(200), FCC(220), and FCC(311) peaks without any preferred orientation. On the other hand NiCo thin films make up of HCP(100), FCC(111), HCP(101), FCC(200), FCC(220) or HCP(110), FCC(311) or HCP(112) and FCC(222) peaks. It was revealed from the analysis of XRD result that FCC(111) peak at the NiCo thin film electrodeposited from the bath with 0.084 M CoCl₂ concentration can be regarded as the preferred orientation. However the peak of the preferred orientation was changed to FCC(220) or HCP(110) above 0.084 M CoCl₂ concentration in the baths. Then the intensity of FCC(220) or HCP(110) peak was gradually decreased with increasing CoCl₂ concentration further. The crystalline size of pure Ni thin film was observed to be about 53 ㎛ and those of NiCo thin films were in the range of 35~45 ㎛.

• 한국표면공학회지
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• 제37권1호
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• pp.40-48
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• 2004

Hardness and internal stress are very important in nickel electroforming. Nickel sulfamate bath has been widely used in electroforming because of its low internal stress and moderate hardness. Nickel sulfamate bath without chloride was chosen to investigated the effect of plating variable such as temperature, PH, current density and sodium naphthalene trisulfonate as addition agent on the hardness and internal stress. It was found that hardness increased with increasing temperature and decreasing current density and ranged from 150∼310 DPH. The hardness was highest at $55^{\circ}C$ and 10∼40 mA/$\textrm{cm}^2$. The internal stress increased with increasing current density and decreasing temperature. It was minimum at PH 3.0∼3.8. Low internal stress within $\pm$1,500 psi was obtained at both $50^{\circ}C$ and $55^{\circ}C$ in 10-20 mA/$\textrm{cm}^2$. The addition of sodium naphthalene trisulfonate was found to be effective in refine columnar grains thus resulted in decreasing internal stress, increasing hardness and improving brightness.

• 한국표면공학회지
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• 제51권1호
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• pp.62-70
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• 2018

Sulfamate plating solution containing a small amount of chloride bath was fabricated to study the properties of the electrodeposited Ni thin films. Effects of the changes of current density and additive concentration on current efficiency, residual stress, surface morphology and microstructure of Ni thin films electrodeposited from Ni sulfamate-chloride baths were investigated. The current efficiency was measured to be more than about 95%, independent of the changes of current density and saccharin concentration in the baths. Residual stress of Ni thin film was appeared to be the compressive stress modes in the range of $5{\sim}30mA/cm^2$ current density. Maximum compressive stress was observed at the current density of $10mA/cm^2$. Compressive stress values of Ni thin/thick films were increased to be about -85~-100 MPa with increasing saccharin concentration from 0 to 0.0195 M(4 g/L). Surface morphology was changed from smooth to nodule surface appearance with increasing the current density. Smooth surface morphology of Ni thin films electrodeposited from the baths containing saccharin was observed, independent of the saccharin concentration. Ni thin/thick films consist of FCC(111), FCC(200), FCC(220), FCC(311) and FCC(222) peaks. It was revealed that the FCC(200) peak of Ni thin films is the preferred orientation in the range of $5{\sim}30mA/cm^2$ current density. The intensity of FCC(200) peak was gradually decreased and the intensity of FCC(111) peak was increased with increasing saccharin concentration in the baths.

• 한국표면공학회지
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• 제38권1호
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• pp.14-20
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• 2005

The control of internal stress is extremely important in electroforming because of the deliberately low adhesion between the electro form and the mandrel. Excessive tensile or compressive stress can cause distortion, separation problem, curling, peeling or separation of electroform prematurely from the mandrel, buckling and blistering. Nickel sulfamate bath has been widely used in electroforming because of its low internal stress and moderate hardness. In this study, real-time stress sensor has been used for stress control in chloride-free nickel sulfamate bath for 400 mm x 300 mm x 500 ㎛ nickel electroform. It was found that compressive stress found at low current density indicated the contamination of electrolyte, which is very useful in procuring buckling and peeling of electroform. No compressive stress is allowed for plate electroform. The real-time stress can also be used for accurate stress control of nickel electroform. The tensile stress was found to be increased slightly with increase in nickel electroform thickness, i.e., from initial 1.47 ksi to 2.02 ksi at 320 ㎛.