• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2000.11a
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• pp.3-4
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• 2000

Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.

• Journal of the Korean association of regional geographers
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• v.4 no.1
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• pp.77-98
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• 1998

In general, spatial imbalance in regional growth is a major cause of social and political conflicts within a state. In Korea, this inequality has functioned as a threat to the state's integration. With the economic development policies by regional industrialization over the past three decades, most of the industrial activities have been concentrated in Seoul and Pusan metropolitan areas, which are surrounded by Kyonggi, Kyongnam provinces respectively. Compared to these areas, Chonnam and Chonbuk provinces have lagged behind in economic development. Therefore, in order to increase the regional economic development of the southwestern region in Korea, the central government has been enforcing several policies aimed at regional industrialization since the 1980s. The purpose of this study focuses on the regional economic impacts of a newly established industrial estate-Yulchon industrial complex- which would act as a regional growth center in the Kwangyang bay area. The Kwangyang bay area consists of several industrial estates such as Kwangyang Iron and Steel Co. and its related industrial complex, Chuam rural industrial estate, Yeochon industrial complex, and so on. In addition, the Kwangyang container port was constructed in 1997. The Kwangyang bay area has been changing to a new industrial district in the southwestern part of Korea as a result of industrialization policies which were activated by central government. The Yulchon industrial complex, which is expected to be completed in 2001, would draw many manufacturing plants. For example, Hyundai Motors Co. has a plan to locate a new automobile assembly plant within the estate. As the plan has high probability to be realized, it will be interesting to study the effects a new automobile assembly plant and its related production linkages have on the region. This study is to estimate the expected structural characteristics of automobile production activities in Yulchon. The following details will be discussed: the regional economic impacts of a new automobile industry in Yulchon industrial complex, the production linkage formation via hierarchical subcontracting systems, the alternative strategies to promote the growth of regional economies, and the scheme to improve the auto-parts and components industry in Kwangju and Chonnam provinces by establishing auto-mobile production function. Automoblie industry generally gives great influences on not only regional economies but the related industries, for example, the firms producing automotive components. If a new plant producing automobiles and its related firms producing components are to be established in Yulchon, they will affect on the regional development directions and change the regional characteristics of industrial structure. In order to increase the spread effects of the new industry in Yulchon industrial complex, almost all of the automobile production processes must be organized concurrently within a limited range of distance. There is an imperative that the co-operation system should be structured between the assembly firm and many firms producing its components. In addition to those, it would be required such as the effective division of labors between the firms, much more capabilities in the technical innovations, and the reconstruction of interrelationship between the labor unions and the firms' managers.