• 상하수도학회지
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• 제23권1호
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• pp.69-75
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• 2009

The characteristics of disinfection and organic removal were investigated with pulse UV lamp in this study. The intensity and emission wavelength of pulse UV Lamp were compared with low pressure UV lamp. The emission spectrum range of pulse UV lamp was between 200 and 400 nm while the emission spectrum of low pressure UV lamp was only single wavelength of 254nm. 3 Log inactivation rate of B. subtilis spore by pulse UV and low pressure UV irradiation was determined as $44.71mJ/cm^2$ and $57.7mJ/cm^2$, respectively. This results implied that wide range of emission spectrum is more effective compared to single wavelength emission at 254nm. 500ng/L of initial 2-MIB concentration was investigated on the removal efficiency by UV only and $UV/H_2O_2$ process. The removal efficiency of UV only process achieved approximately 80% at $8,600mJ/cm^2$ dose. 2-MIB removal rate of $UV/H_2O_2$ (5 mg/L $H_2O_2$) process was 25 times increased compared to UV only process. DOC removal efficiency for the water treatment plant effluent was examined. The removal efficiency of DOC by UV and $UV/H_2O_2$ was no more than 20%. Removal efficiency of THMFP(Trihalomethane Formation Potential), one of the chlorination disinfection by-products, is determined on the UV irradiation and $UV/H_2O_2$ process. Maximum removal efficiency of THMFP was approximately 23%. This result indicates that more stable chemical structures of NOM(Natural Organic Matter) than low molecule compounds such as 2-MIB, hydrogen peroxide and other pollutants affect low removal efficiency for UV photolysis. Consequently, pulse UV lamp is more efficient compared to low pressure lamp in terms of disinfection due to it's broad wavelength emission of UV. Additional effect of pulse UV is to take place the reactions of both direct photolysis to remove micro organics and disinfection simultaneously. It is also expected that hydrogen peroxide enable to enhance the oxidation efficiency on the pulse UV irradiation due to formation of OH radical.

• 생명과학회지
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• 제21권12호
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• pp.1710-1715
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• 2011

Nano plasma ion (NPi) generator에서 발생한 NPi의 미생물에 대한 살균 효과를 측정하기 위해 미생물 종류, 조사 시간, 챔버 용적, 이온 수량, 거리에 따라 실험 하였다. 먼저 6종의 미생물 Escherichia coli, Pseudomonas aeruginosa, Salmonella typhimurium, Klebsiella pneumoniae, Staphylococcus aureus, Bacillus subtilis를 대상으로 실험한 결과 미생물 종류에 따라 각각 다른 감소율을 나타냈으며, 그람 음성균인 E. coli가 96.57%로 가장 높았고, 그람 양성균 중 포자를 생성하는 B. subtilis가 57.41%로 가장 낮았다. 그리고 NPi 조사시간에 따라 살균력 측정한 결과, 반응 초기에 대부분의 미생물이 사멸하였으며 이후 서서히 증가하였다. 또한 챔버의 크기에 따른 E. coli의 감소율을 비교하였으며 $0.005m^3$부터 $30m^3$까지 5개 챔버에서 NPi를 2시간 조사한 결과 용적이 증가함에 따라 포화이온 농도는 낮아졌고 이와 함께 살균력도 감소하였다. 이에 $1m^3$ 챔버에 NPi generator를 추가로 설치하여 포화 이온농도에 따른 E. coli의 감소율을 알아보았고 포화 이온 농도가 증가함에 따라 감소율도 함께 증가하는 것으로 나타났다. 마지막으로 NPi generator의 거리에 따른 E. coli의 감소율을 확인하였고 이온이 직접적으로 분출되는 부분의 99.19%를 제외한 나머지 위치에서 팬에 의한 이온 순환으로 포화농도가 비슷하게 유지 되었으며 약 97%의 감소율을 나타냈다.