• Title/Summary/Keyword: specularly reflected light

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A Study on Roughness Measurement of Polished Surfaces Using Reflected Laser Beam Image (레이저빔 반사 화상을 이용한 연마면 거칠기 측정법에 관한 연구)

  • Shen, Yun-Feng;Lim, Han-Seok;Kim, Hwa-Young;Ahn , Jung-Hwan
    • Journal of the Korean Society for Precision Engineering
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    • v.16 no.2 s.95
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    • pp.145-152
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    • 1999
  • This paper presents the principle and experimental results of a non-contact surface roughness measurement by means of screen projected pattern of lase beam reflected from a polished surface. In the reflected laser beam pattern especially from a fine surface like ground or polished one, light intensity varies from the center fo the image to its boundary as the Gaussian distribution. The standard deviation of a light intensity distribution is assumed to be a good non-contact estimator for measuring the surface roughnes, because the light reflectivity is known to be well related with the surface roughness. This method doesn't need to discriminate between the specularly reflected light and the diffusely reflected one, whereas the scattered laser intensity method must do. Nor it needs to adjust the change of light intensity caused by environmental lights or specimen materials. Reflected laser beam pattern narrowly spreads out in the vertical direction to tiny scratches on the polished surface due to abrasives. The deeper the scratch the more the dispersion, which means the rougher surface. The standard deviation of the pattern is nearly in proportion to the surface roughness. Measurement errors by this method are shown to be below 10 percent compared with those obtained by a common contact method. The inclination of measuring unit from the normal axis causes the measurement errors up to 10 percent for an angle of 4 degree. Therefore the proposed method can be used as an on-the-machine quick roughness estimator within 10 percent measurement error.

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Development of An Optical Surface Roughness Sensor for On-the-Machine Measurement (기상 측정을 위한 광학적 표면 거칠기 측정 센서 개발)

  • Kim, Hyun-Soo;Hong, Seong-Wook
    • Journal of the Korean Society for Precision Engineering
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    • v.11 no.6
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    • pp.168-178
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    • 1994
  • This paper presents an optical surface roughness sensor developed for intermediate- process measurement on the machine. The light scattering method is adopted for the sensor, which is designed conpact and flexible enough to apply to 'on the machine' measurement of surface roughness. The developed sensor has special features such that it makes use, as the measurement parameter, of the ratio between fluxes of the incident light, and the specularly and partly diffusely reflected light, and that it can adjust the incident light angle. The experimental investigation reveals not only the sensor has good performance as a surface roughness sensor but the sensor is very robust so as to be useful in in-process measurement.

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A Method for Measurement of Roughness of Ground Surfaces by Using Fluxes of Scattered Lights (산란광속측정에 의한 연삭가공 표면 거칠기 측정방법)

  • Hong, Seong-Wook;Kim, Hyun-Soo
    • Journal of the Korean Society for Precision Engineering
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    • v.12 no.4
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    • pp.46-54
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    • 1995
  • This paper presents a simple method for measurenemt of roughness of ground surfaces. The present method utilizes fluxes of scattered lights condensed through lenses aligned along the specular direction. A theoretical analysis is preformed for the purpose of investigating the possibility of the method as well as determining the experimental condition. Experiments are also performed to show the effectiveness and robustness of the proposed method. The theoretical and experimental results show that the proposed method is simple enouth to implement and has a potential to identify a wide range of roughness of ground surfaces.

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Defect Inspection of Extreme Ultra-Violet Lithography Mask (극자외선 리소그래피용 마스크의 결함 검출)

  • Yi Moon-Suk
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.8 s.350
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    • pp.1-5
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    • 2006
  • At-wavelength inspection system of extreme Ultra-violet lithography was developed and the inspection results were compared with the optical mask inspection system by cross correlation experiments. In at-wavelength EUV mask inspection system, a raster scan of focused euv light is used to illuminate euv light to mask blank and specularly and non-specularly reflected euv light are detected by photo diode and microchannel plate. The cross correlation results between at-wavelength inspection tool and optical inspection tool shows strong correlation. Far-field scattering fringe pattern from programmed phase and opqque defect, which were detected by phosphor plate and CCD camera shows that distinct diffraction fringes were observed with fringe spacing dependent on the defect size.

A study on the defect inspection on the LCD polarizer film using the Vision system (비젼 시스템을 이용한 LCD용 편광 필름의 결함 검사에 관한 연구)

  • 박종성;정규원;강찬구
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2002.10a
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    • pp.164-169
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    • 2002
  • Recently, LCD(Liquid Crystal Display) is the display product widely used on various fields of industry. This is generally composed of many parts. Among many parts, polarizer film control the intensity of the transmitted light according to the degree of rotation of the polarizer axis. Therefore, this film must be free from defects. But it contains many defects such as the defects caused by dust or different thing, adhesive badness, scratch. Presently, the inspection of these defects is depending on the sight of operator. In this paper, we propose the vision system composed of telecentric lens and optical mirror. This system use the coaxial illumination and the light is specularly reflected on the optical mirror. And we develop the image processing algorithm using the threshold and morphological technique.

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