• 한국표면공학회지
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• 제29권5호
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• pp.556-562
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• 1996

Carbon nitride (CN) films were synthesized on silicon substrates by a combined ion-beam and laser-ablation method under various conditions; ion-beam energy and ion-beam current were varied. Raman spectroscopy and spectroscopic ellipsometry (SE) were employed to characterize respectively the structural and the optical properties of the CN films. Raman spectra show that all the CN films are amorphous independent of the ion-beam current and the ion-beam energy. Refractive indices, extinction coefficients and optical band gaps which were determined from the measured SE spectra exhibit a significant dependence on the synthesis conditions. Especially, the decrease of the refractive indices and the shrinkage of the optical band gap is noticeable as the ion-beam current and/or the ion-beam energy increase.

• 한국표면공학회지
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• 제29권5호
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• pp.532-539
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• 1996

Diamond-like carbon (DLC) films were deposited on silicon substrates by the plasma decomposition of hydrocarbons under various conditions, and studied by the spectroscopic ellipsometry (SE). We used the effective medium approximation with the dispersion model developed by Forouhi and Bloomer to determine simultaneously both the structure and the optical constants of the DLC films from their ellipsometric spectra. Especially, we investigated the variation of the multilayer structure including the interface layer, of the refractive indices, and of the extinction coefficients as the deposition conditions were varied; substrate pretreatment procedure, hydrocarbon precursors, and the substrate bias voltage were varied.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.385-385
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• 2010

Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different oxygen concentration. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was in the range of 100-400 nm. AFM images show that the surface morphology was depended on the oxygen ratio. The crystal structure of copper oxide films was changed from metallic copper to copper oxide with increasing oxygen concentration. The oxidation states of Cu 2p and O 1s resulted from XPS were consistent with XRD results.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.384-384
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• 2010

Zirconium oxynitride films were obtained by r.f. reactive magnetron sputtering of a zirconium target with nitrogen flow rate ranging from 0 to 60 sccm. The phases present in the films were determined by X-ray diffraction (XRD). Measurements of the oxidation state $ZrON_x$ films were investigated by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). Thickness of these samples was estimated by spectroscopic ellipsometry (SE) and scanning electron microscopy (SEM). We found that the surface morphology of $ZrON_x$ films measured by atomic force microscopy (AFM) was also depended on the nitrogen gas flow.

• Journal of Korean Vacuum Science & Technology
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• 제3권2호
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• pp.112-115
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• 1999

The real ($\varepsilon$1) and imaginary ($\varepsilon$2) parts of the dielectric function of ZnS have been measured by spectroscopic ellipsometry (SE) in the 3.7-6.0 eV photon-energy range at room temperature. The obtained dielectric function spectra reveal distinct structures at energies E0/(E0+$\Delta$0) and E1 critical points. The spectrum after chemical treatment to remove surface oxide overlayer showed that these data seem to be the best representation of the dielectric function of ZnS, having the largest $\varepsilon$2 value at E1 peak region reported so far by SE. Dielectric-related optical constants of ZnS, such as the complex refractive indices (n+n=ik), absorption coefficient, and reflectance, are also presented.

• Journal of the Optical Society of Korea
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• 제18권4호
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• pp.359-364
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• 2014

We report parameters that allow the dielectric functions ${\varepsilon}={\varepsilon}_1+i{\varepsilon}_2$ of $AlAs_xSb_{1-x}$ alloys to be calculated analytically over the entire composition range $0{\leq}x{\leq}1$ in the spectral energy range from 0.74 to 6.0 eV by using the dielectric function parametric model (DFPM). The ${\varepsilon}$ spectra were obtained previously by spectroscopic ellipsometry for x = 0, 0.119, 0.288, 0.681, 0.829, and 1. The ${\varepsilon}$ data are successfully reconstructed and parameterized by six polynomials in excellent agreement with the data. We can determine ${\varepsilon}$ as a continuous function of As composition and energy over the ranges given above, and ${\varepsilon}$ can be converted to complex refractive indices using a simple relationship. We expect these results to be useful for the design of optoelectronic devices and also for in situ monitoring of AlAsSb film growth.

• Journal of Radiation Protection and Research
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• 제41권2호
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• pp.167-171
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• 2016

Background: TlBr is of considerable technological importance for radiation detection applications where detecting high-energy photons such as X-rays and ${\gamma}$-rays are of prime importance. However, there were few reports on investigating optical properties of TlBr itself for deeper understandings of this material and for making better radiation detection devices. Thus, in this paper, we report on the optical characterizations of TlBr single crystals. Spectroscopic ellipsometry (SE) and photoluminescence (PL) measurements at RT were performed for this work. Materials and Methods: A 2-inch TlBr single crystalline ingot was grown by using the vertical Bridgman furnace. SE measurements were performed at RT within the photon energy range from 1.1 to 6.5 eV. PL measurements were performed at RT by using a home-made PL system equipped with a 266 nm-laser and a spectrometer. Results and Discussion: Dielectric responses from SE analysis were shown to be slightly different among the different samples possibly due to the different structural/optical properties. Also from the PL measurements, it was observed that the peak intensities of the middle samples were significantly higher than those of the other two samples. With the given values for permittivity of free space (${\varepsilon}_0=8.854{\times}10^{-12}F{\cdot}m^{-1}$), thickness (d = 1 mm), and area ($A=10{\times}10mm^2$) of the TlBr sample, capacitances of TlBr were 6.9 pF (at $h{\nu}=3eV$) and 4.4 pF (at $h{\nu}=6eV$), respectively. Conclusion: SE and PL measurement and analysis were performed to characterize TlBr samples from the optical perspective. It was observed that dielectric responses of different TlBr samples were slightly different due to the different material properties. PL measurements showed that the middle sample exhibited much stronger PL emission peaks due to the better material quality. From the SE analysis, optical, dielectric constants were extracted, and calculated capacitances were in the few pF range.

• 한국자기학회지
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• 제21권2호
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• pp.56-60
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• 2011

준강자성체(ferrimagnet) $Fe_3O_4$를 기반 물질로 하여 주기율표 상에서 Fe와 인접한 전이금속 원소 T(= V, Cr, Mn)가 도핑된 삼원화합물($T_{0.2}Fe_{2.8}O_4$) 박막 시료들을 제작하여 그 광학적 성질을 1~8 eV 범위 내에서 분광타원해석법(spectroscopic ellipsometry)을 이용하여 측정하고 $Fe_3O_4$에서의 결과와 비교하였다. V, Cr, Mn 도핑 시 선호되는 스피넬(spinel) 구조 상의 양이온 자리(site) 및 이온수(ionicity)와 연관된 전자구조 상의 변화에 근거하여 삼원화합물과 $Fe_3O_4$의 흡수 스펙트럼 차이의 원인을 분석하였다. $Fe_3O_4$ 및 전이금속 도핑된 화합물들에서 관측된 광학적 흡수 스펙트럼은 주로 Fe 이온의 d 전자가 관련된 이온 간의 전하이동전이(charge-transfer transition)에 의하여 발생하는 에너지 폭이 넓은 흡수구조들의 기여에 의한 것으로 해석된다. 또한, 흡수 스펙트럼에서 관측된 좁은 에너지 폭의 구조들은 사면체 자리에 존재하는 $Fe^{3+}(d^5)$ 이온 내의 d 전자들에 의한 결정장 전이(crystal-field transition)에 기인한 것으로 해석된다. 이와 같은 전이들과 관련된 전자상태들을 스핀편극된 $Fe_3O_4$ 전자구조를 토대로 기술하였다.

• 한국재료학회지
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• 제8권10호
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• pp.961-968
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• 1998

상변화형 광디스크의 보호막으로 사용되는 $ZnS-SiO_2$ 유전체막을 RF magnetron 스퍼트링방법에 의하여 제조하는 경우에 기판 바이어스전압의 영향을 조사하기 위하여, 알곤가스 분위기에서 ZnS(80mol%)-$SiO_2$(20mol%)타겟을 사용하여 Si Wafer와 Corning flass 위에 박막을 증착시켰다. 본 실험에서는 여러 실험 변수를 효과적으로 조절하면서 실험의 양을 줄이고 도시의 산포를 동시에 만족시키는 최적조건으로 타겟 RF 출력 200W, 기판 RF 출력 20W, 아르곤 압력 5mTorr과 증착시간 20분을 얻을 수 있었으며, 신뢰구간 95%에서 확인실험을 수행하였다. 증착된 박막의 열적 저항성을 측정하기 위해 $300^{\circ}C$와 $600^{\circ}C$에서 열처리시험을 수행하였고, Spectroscopic Ellipsometry 측정을 통한 광학적 데이터를 바탕으로 Bruggeman EMA(Effective Medium Approximation)방법을 이용하여 기공(void)분률을 측정하였다. 본 연구결과에 의하면 특성치 굴절률에 대하여 기판 바이어스인자와 증착시간 사이에는 서로 교호작용이 강하게 존재함을 확인할 수 있었다. TEM분석과 XRD 분석 결과에 의하면 기판 바이어스를 가한 최적조건에서 증착된 미세조직은 기존의 바이어스를 가하지 않을 조건에서 증착시킨 박막보다 미세한 구조를 가지며, 또한 과도한 바이어스전압은 결정구조의 조대화를 야기시켰다. 그리고 적절한 바이어스전압은 박막의 밀도를 증가시키며, 기공분률을 약 3.7%정도 감소시킴을 확인할 수 있었다.

• 청정기술
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• 제16권3호
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• pp.191-197
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• 2010

초임계이산화탄소에서 실릴화제를 사용하여 반응시간, 압력, 온도를 변화하며 플라스마에 의해 손상된 다공성 p-SiOCH 필름의 실릴화 보수반응을 진행하였다. FT-IR 분석 결과 $3150{\sim}3560cm^{-1}$ 영역의 $SiOH/H_2O$ 특성밴드의 감소는 다소 확인할 수 있었지만, 메틸화 peak의 변화치는 관찰하기 어려웠다. 그러나 실릴화에 따른 표면 소수성은 빠른 반응시간 내에 복원되었다. 내부 복원반응을 효과적으로 유도하기 위하여 열 전처리 공정을 상압 또는 진공 조건에서 진행하였으며, 전처리에 따라 표면 접촉각이 약간 상승하였고, 뒤이은 초임계 실릴화반응으로 표면 소수성이 완전히 복원되는 것을 관찰하였다. 플라스마 손상과정에서 표면 내부 메틸기의 감소가 나타나지만 실릴화 보수반응에 따라 메틸기의 복원은 눈에 띄게 나타나지 않음을 FT-IR, spectroscopic ellipsometry 와 secondary ion mass spectroscopy의 분석결과를 통하여 확인하였다. 막질에 대한 Ti 증착 후 glow discharge spectrometry로 내부 Ti 원소를 분석한 결과, 초임계 실릴화반응을 통하여 손상된 p-SiOCH막질의 열린 기공의 봉인효과가 나타나는 것을 확인하였다.