• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.9
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• pp.656-661
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• 1999

As a fundamental study for FED tubeless packaging, sodalime-sodalime electrostatic bonding was performed by using on the developed bonding mechanism. Thebonding properties of the bonded sodalime-sodalime structure were investigated through SEM and SIMS analyses. Mo-tip FEA was vacuum-packaged by the developed bonding process and the packaged device generated the field emission current.

• Proceedings of the KIEE Conference
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• 1998.11c
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• pp.1004-1006
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• 1998

Mo-tip FED of 1 inch diagonal was vacuum sealed using sodalime-to-sodalime glass electrostatic bonding under $10^{-7}torr$. The bonding properties of the bonded sodalime-to sodalime structure were investigated and emission characteristic of packaged FED panel was measured.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.103-106
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• 1999

In this paper, we suggest the FED packaging technology that have 4mm thickness, using sodalime glass-to-sodalime glass electrostatic bonding. It based on conventional silicon-glass bonding. The silicon film was deposited an around the exhausting hole on FED backside panel. And then, the silicon film of panel was successfully bonded with capping(bare) glass in vacuum environment and the FED panel was vacuum-sealed. In this method, we could achieve more 153 times increased conductance and 200 times increased vacuum efficiency than conventional tube packaging method. The vacuum level in panel, by SRG test, was maintained about low 10$_{-4}$ Torr during above two months And, the light emission was observed to 0.7-inch tubeless packaged FED. Then anode current was 34 $\mu$ A. Emission stability was constantly measured for 10 days.

• Journal of the Microelectronics and Packaging Society
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• v.7 no.1
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• pp.7-12
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• 2000

As an essential technology for the FED, VFD and PDP packaging having merits of no glass frit and no glass tube usage, two sodalime glass substrates were electrostatically-bonded in a vacuum environment, and the bond properties were compared with the case of bonding in atmosphere. The glass wafer pairs bonded in vacuum using a-Si interlayer had a relatively lower bond strength than the ones bonded in atmosphere under same bonding conditions (temperature and voltage). And the bond strength was increased in the case of oxygen ambient. Through the XPS and SIMS analyses fur the surface region of a-silicon and bulk glass, it might be concluded that the lower bonding strength was originated from the inactive silicon oxide growth occurred during the electrostatic bonding process due to oxygen deficiency in vacuum.