• E2M - 전기 전자와 첨단 소재
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• 제8권2호
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• pp.171-175
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• 1995

Optimum condition of remote plasma enhanced chemical vapor deposition using orthogonal array method was chosen. Characteristics of oxide films deposited by RPECVD with SiH$_{4}$ and N$_{2}$O gases were investigated. Etching rate of the optimized SiO$_{2}$ films in P-etchant was about 6[A/s] that was almost the same as that the high temperature thermal oxide. The films showed high dielectric breakdown field of more than 7[MV/cm] and a resistivity of 8*10$^{13}$ [.ohmcm] around at 7[MV/cm]. The interface trap density of SiO$_{2}$/Si interface around the midgap derived from the high frequency C-V curve was about 5*10$^{10}$ [/cm$^{2}$eV]. It was observed that the dielectric constant of the optimized SiO$_{2}$ film was 4.29.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2002년도 추계종합학술대회
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• pp.143-147
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• 2002

본 논문에서는 FBAR소자에서 중요한 역할을 하는 Reflector의 최적 증착조건을 RF/DC마그네트론 스퍼터링을 이용하여 조사하였다. Reflector를 구성하는 SiO$_2$와 W박막의 증착속도, 결정성, 표면거칠기 둥을 다양한 증착조건에서 관찰한 결과 빠른 증착속도를 보이면서 치밀하고 결정성이 좋은 박막을 얻을 수 있는 조건을 찾을 수 있었고, 이 조건으로 5층의 Acoustic Bragg Reflector 구조를 제작하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.134-135
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• 2008

Ultra-thin $SiO_2/ZrO_2$ dielectrics were deposited by atomic layer chemical vapor deposition (ALCVD) method for non-volatile memory application. Metal-oxide-semiconductor (MOS) capacitors were fabricated by stacking ultra-thin $SiO_2$ and $ZrO_2$ dielectrics. It is found that the tunneling current through the stacked dielectric at the high voltage is lager than that through the conventional silicon oxide barrier. On the other hand, the tunneling leakage current at low voltages is suppressed. Therefore, the use of ultra-thin $SiO_2/ZrO_2$ dielectrics as a tunneling barrier is promising for the future high integrated non-volatile memory.

• 대한기계학회논문집B
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• 제32권10호
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• pp.800-809
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• 2008

Scanning Thermal Microscope (SThM) is the tool that can map out temperature or the thermal property distribution with the highest spatial resolution. Since the local temperature or the thermal property of samples is measured from the extremely small heat transferred through the nanoscale tip-sample contact, improving the sensitivity of SThM probe has always been the key issue. In this study, we develop a new design and fabrication process of SThM probe to improve the sensitivity. The fabrication process is optimized so that cantilevers and tips are made of thermally grown silicon dioxide, which has the lowest thermal conductivity among the materials used in MEMS. The new design allows much higher tip so that heat transfer through the air gap between the sample-probe is reduced further. The position of a reflector is located as far away as possible to minimize the thermal perturbation due to the laser. These full $SiO_2$ SThM probes have much higher sensitivity than that of previous ones.

• 한국표면공학회지
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• 제53권5호
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• pp.201-206
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• 2020

A SiOxCy(-H) thin film was synthesized by atmospheric pressure dielectric barrier discharge(APDBD), and a SiO₂-like layer was formed on the surface of the film by oxidation treatment using oxygen plasma. Hexamethylcyclotrisiloxane was used as a precursor for the SiOxCy(-H) synthesis, and He gas was used for stabilizing APDBD. Oxygen permeability was evaluated by forming an oxidized SiOxCy(-H) thin film on a PET film. When the single-layer oxidized SiOxCy(-H) film was coated on the PET, the oxygen gas permeability decreased by 46% compared with bare PET. In case of three-layer oxidized SiOxCy(-H) film, the oxygen gas permeability decreased by 73%. The oxygen permeability was affected by the thickness of the SiO₂-like layer formed by oxidation treatment rather than the thickness of the SiOxCy(-H) film. The excellent corrosion resistance was demonstrated by coating an oxidized SiOxCy(-H) thin film on the silver-coated aluminum PCB for light emitting diode (LED).

• 한국전기전자재료학회논문지
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• 제17권6호
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• pp.580-585
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• 2004

Silicon dioxide (SiO$_2$) is widely used as a gate dielectric material for thin film transistors (TFT) and semiconductor devices. In this paper, SiO$_2$ films were grown by APCVD(Atmospheric Pressure chemical vapor deposition) at the high temperature. Experimental investigations were carried out as a function of $O_2$ gas flow ratios from 0 to 200 1pm. This article presents the SiO$_2$ gate dielectric studies in terms of deposition rate, refrative index, FT-IR, C-V for the gate dielectric layer of thin film transistor applications. We also study defect passivation technique for improvement interface or surface properties in thin films. Our passivation technique is Forming Gas Annealing treatment. FGA acts passivation of interface and surface impurity or defects in SiO$_2$ film. We used RTP system for FGA and gained results that reduced surface fixed charge and trap density of midgap value.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.66-66
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• 2007

Lead zirconate titanate (PZT) is one of the most attractive perovskite-type materials for ferroelectric random access memory (FRAM) due to its higher remanant polarization and the ability to withstand higher coercive fields. We first applied the damascene process using chemical mechanical polishing (CMP) to fabricate the PZT thin film capacitor to solve the problems of plasma etching including low etching profile and ion charging. The $0.8{\times}0.8\;{\mu}m$ square patterns of silicon dioxide on Pt/Ti/$SiO_2$/Si substrate were coated by sol-gel method with the precursor solution of PZT. Damascene process by CMP was performed to pattern the PZT thin film with the vertical sidewall and no plasma damage. The polarization-voltage (P-V) characteristics of PZT capacitors and the current-voltage characteristics (I-V) were examined by change of process parameters. To examine the CMP induced damage to PZT capacitor, the domain structure of the polished PZT thin film was also investigated by piezoresponse force microscopy (PFM).

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.214.1-214.1
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• 2013

Tetra-ethoxysilane (TEOS)은 일반적으로 저온 게이트 산화막의 원료 널리 이용되고 있으나 as-deposited 상태에서는 필수적으로 생성된 높은 계면밀도와 고정전하를 제거하기 위하여 수소계면처리, forming gas annealing 등 후처리 공정을 필수적으로 거처야만 한다. 즉 후처리 공정 없이도 일정수준의 계면밀도와 고정전하를 갖을 수 있는 출발물질이 제안되면 산업적 의미를 갖을 것이다. 본 연구에서는 TEOS를 대체할 수 있는 후보재료로써 Tetra-iso-propoxysilane (T-iso-POS)을 제안하였다. T-iso-POS는 iso 구조의 3차원적 특수 구조를 가지므로 더 쉽게 분해 될 수 있어 탄소의 결합을 억제 할 수 있다고 사료된다. 용량 결합형 PECVD (13.56 MHz) 장비를 이용하여 RCA 세정을 실시 한 p-Si (100) 기판위에 TEOS 혹은 T-iso-POS (2 sccm)와 O2를 도입(50 sccm), 플라즈마 전원(20~100 W), 압력(0.1~0.5 torr), 온도 ($170{\sim}400^{\circ}C$), 전극 간 거리 (1~4.5cm)의 조건 하에서 증착하였다. 얻어진 각각의 SiO2 막에 대해, 성장 속도, 2% BHF 용액보다 에칭 속도, IV 특성과 C-V 특성, FT-IR에 의해 화학구조 평가를 실시했다. T-iso-POS원료로 사용하여 TEOS보다 낮은 약 $200^{\circ}C$에서 증착 된 산화막에서 후 처리 없이도 10 MV/cm 이상의 절연 파괴 특성을 나타내는 우수한 게이트 절연막 제작에 성공했다. 그 성장 속도도 약 20 nm/min로 높았다.

• 정보저장시스템학회논문집
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• 제2권1호
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• pp.85-90
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• 2006

In this study, measurement of thermal conductivity of multilayer thin dielectric film has been conducted via differential $3\omega$ method. Also, verification of differential $3\omega$ method has been accomplished with various proposed criteria. The target film for the measurement is 300 nm thick silicon dioxide which is covered with upper protective layer of various thicknesses. The upper protective layer is inserted between the target film and the heater line for purpose of electrical insulator or anti-oxidation barrier since the target film may be a good electrical conductor or a well-oxidizing material. Since the verification of differential $3\omega$ method has not been conducted yet, we have shown that the measurement of thermal conductivity of thin films with upper protective layer via differential $3\omega$ method is verified to be reliable as long as the proposed preconditions of the samples are satisfied. Experimental results show that the experimental errors tend to increase with aspect ratio between thickness of the upper protective layer and width of the heater line due to heat spreading effect.

• Computers and Concrete
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• 제20권6호
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• pp.711-718
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• 2017

Nanotechnology is a new filed in concrete structures which can improve the mechanical properties of them in confronting to impact and blast. However, in this paper, a mathematical model is introduced for the concrete models subjected to impact load for wave propagation analysis. The structure is simulated by the sinusoidal shear deformation theory (SSDT) and the governing equations of the concrete model are derived by energy method and Hamilton's principle. The silicon dioxide ($SiO_2$) nanoparticles are used as reinforcement for the concrete model where the characteristics of the equivalent composite are determined using Mori-Tanaka approach. An exact solution is applied for obtaining the maximum velocity of the model. In order to validate the theoretical results, three square models with different impact point and Geophone situations are tested experimentally. The effect of different parameters such as $SiO_2$ nanoparticles volume percent, situation of the impact, length, width and thickness of the model as well as velocity, diameter and height of impactor are shown on the maximum velocity of the model. Results indicate that the theoretical and experimental dates are in a close agreement with each other. In addition, using from $SiO_2$ nanoparticles leads to increase in the stiffness and consequently maximum velocity of the model.