• 제목/요약/키워드: secondary beam

검색결과 305건 처리시간 0.029초

초기 비틀림각을 갖는 비균일 박판보 블레이드의 진동제어 (Vibration Control of Rotating Composite Thin-Walled Pretwisted Beam with Non-uniform Cross Section)

  • 임성남;나성수
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2003년도 추계학술대회논문집
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    • pp.944-949
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    • 2003
  • This paper addresses the control of free and dynamic response of composite rotating pretwisted blade modeled as non-uniform thin-walled beam fixed at the certain presetting and pretwisted angle and incorporating piezoelectric induced damping capabilities. A distributed piezoelectric actuator pair is used to suppress the vibrations caused by external disturbances. The blade model incorporates non-uniform features such as transverse shear, secondary warping and includes the centrifugal and Coriolis force field. A velocity feedback control law relating the piezoelectiriccally induced transversal bending moment at the beam tip with the appropriately selected kinematical response quantity is used and the beneficial effects upon the closed loop eigenvibration and dynamic characteristics of the blade are highlighted.

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열전자형 주사전자현미경 결상특성의 수치해석 (Numerical Analysis for the Image Evaluation of a Thermionic SEM)

  • 정현우;박만진;김동환;장동영;박근
    • 한국공작기계학회논문집
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    • 제16권6호
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    • pp.153-158
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    • 2007
  • The present study covers numerical analysis of a thermionic scanning electron microscope(SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. For a systematic design of the electron optical system, the beam trajectories are investigated through numerical analyses by tracing the ray path of the electron beams, and the quality of resulting image is evaluated from the analysis results.

Ag/a-$Se_{75}$$Ge_{25}$박막의 Ag Doping Mechaism 해석[I]

  • 김민수;이현용;정홍배;이영종
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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    • pp.113-115
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    • 1994
  • We considered the ion and photo-induced properties as a function of wavelength by exposing the light over the band gap of a-Ag/a-$Se_{75}$$Ge_{25}$ and the low-energy defocused $Ga^{+}$ ion beam on Ag/a-$Se_{75}$$Ge_{25}$ thin film. This film acts as a negative resist for photo or ion beam lithography. We observed that the absorbance coefficient decreased with increasing the photo-exposing time and exposing the ion beam. The bandgap shifts toward longer wavelength called a "darkening effect" are observed in the films exposed to both photons and ions. We suggest that a primary step in the Ag layer and a secondary step is in a-$Se_{75}$$Ge_{25}$ film layer.

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Factors governing redistribution of moment in continuous prestressed concrete beams

  • Kodur, V.K.R.;Campbell, T.I.
    • Structural Engineering and Mechanics
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    • 제8권2호
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    • pp.119-136
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    • 1999
  • The failure load of a continuous prestressed concrete beam depends partially on the amount of redistribution of moment that occurs prior to failure. Results from a parametric study, carried out using a nonlinear finite element computer program, are presented to demonstrate the influences of various factors on redistribution of moment in two-span, continuous bonded prestressed concrete beams. Trends in the data from the numerical studies are compared with those from a theoretical expression for percentage of redistribution, and it is shown that the redistribution of moment occurring in a continuous prestressed concrete beam is a function of number of parameters.

Step-Up 구조를 갖는 다층박막 초소형 구동소자의 초기변형 최소화에 관한 연구 (Minimization of Initial Deflection of Multi-Layered Micro-Actuator with Step-Up Structure)

  • 이희중;강신일
    • 대한기계학회논문집A
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    • 제26권11호
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    • pp.2415-2420
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    • 2002
  • In the present study, a new anchor design was proposed to minimize the initial deflection of micro multi-layer cantilever beam with step-up structure, which is a key component of thin film micro-mirror array. It is important to minimize the initial deflection, caused by residual stress, because it reduces the performance of the actuation. Theoretical and experimental studies were conducted to examine the cause of the initial bending deflection. It was found that the bending deflection at the anchor of the cantilever beam was the primary source of initial deflection. Various anchor designs were proposed and the initial deflections for each design were calculated by finite element analysis. The analysis results were compared with experiments. To reduce the initial deflection a secondary support was added to the conventional structure. The optimal shapes were obtained by simulation and experiment. It was found from the analysis that the ratio or horizontal and vertical dimensions of secondary support was the governing factor, which affected the initial deflection.

Sputtering yield and secondary electron emission coefficient ($\gamma$) of the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ thin film grown on the Cu substrate by using the Focused Ion Beam

  • Jung, Kang-Won;Lee, H.J.;Jeong, W.H.;Oh, H.J.;Choi, E.H.;Seo, Y.H.;Kang, S.O.;Park, C.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.877-881
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    • 2006
  • We obtained sputtering yields for the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ films using the FIB system. $MgAl_2O_4/MgO$ protective layers have been found to have less $24^{\sim}^30%$ sputtering yield values from 0.24 atoms/ion up to 0.36 atoms/ion than MgO layers with the values from 0.36 atoms/ion up to 0.45 atoms/ion for irradiated $Ga^+$ ion beam whose energies ranged from 10 keV to 14 keV. And $MgAl_2O_4$ layers have been found to have lowest sputtering yield values from 0.88 up to 0.11. It is also found that $MgAl_2O_4/MgO$ and MgO have secondary electron emission $coefficient({\gamma})$ values from 0.09 up to 0.12 for $Ne^+$ ion whose energies ranged from 50 eV to 200 eV.

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단일 이온원을 사용하는 이온빔 스퍼터링법에 의한 Mn-Zn 페라이트 박막의 증착 기구 (Characteristics in the Deposition of Mn-Zn Ferrite Thin Films by Ion Beam Sputtering Using a Single Ion Source)

  • 조해석;하상기;이대형;홍석경;양기덕;김형준;김경용;유병두
    • 한국재료학회지
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    • 제5권2호
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    • pp.239-245
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    • 1995
  • 단일 이온원을 사용하는 이온빔 스퍼터링법을 이용하여 Mn-Zn페라이트 박막을 증착하였다. 기판은 1000$\AA$의 산화막이 입혀진 실리콘 웨이퍼를 사용하고 타깃은 (110)Mn-Zn 페라이트 단결정위에 Fe 금속선을 부착한 모자이크 타깃을 사용하엿다. 산소의 유입없이 성장된 박막은 금속선으로부터 스퍼터링된 금속이온들에 의해 상대적인 산소결핍을 나타내어 Wustite 구조를 가졌으며, 이를 해결하기 위해 기판주위로 산소를 유입시켜 증착시킨 결과(111) 우선배향성을 가지는 스피넬 페라이트 상의 박막을 얻을 수 있었다.박막의 성장속도는 이온빔 인출전압, 이온빔 입사각이 증가할수록 감소하였고, 기판과 타깃과의 거리가 멀어질수록 감소하였다. 낮은 이온빔 인출전압에서는 인출전압의 증가에 따라서 박막의 결정화가 향상되었지만, 매우 높은 인출전압에서는 이차이온의 에너지가 너무 높아 박막에 손상을 가하게 되므로 인출전압이 증가할수록 박막의 결정화는 오히려 저하되었다. 스피넬 구조를 가지는 페라이트 박막들은 페리자성을 나타내었으며 박막면에 평행한 방향으로 자화용이축을 가졌다.

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Applications of Ar Gas Cluster Ion Beam Sputtering to Ta2O5 thin films on SiO2/Si (100)

  • Park, Chanae;Chae, HongChol;Kang, Hee Jae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.119-119
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    • 2015
  • Ion beam sputtering has been widely used in Secondary Ion Mass Spectrometry (SIMS), X-ray Photoelectron Spectroscopy (XPS), and Auger Electron Spectroscopy (AES) for depth profile or surface cleaning. However, mainly due to severe matrix effects such as surface composition change from its original composition and damage of the surface generated by ion beam bombardment, conventional sputtering skills using mono-atomic primary ions with energy ranging from a few hundred to a thousand volts are not sufficient for the practical surface analysis of next-generation organic/inorganic device materials characterization. Therefore, minimization of the surface matrix effects caused by the ion beam sputtering is one of the key factors in surface analysis. In this work, the electronic structure of a $Ta_2O_5$ thin film on $SiO_2/Si$ (100) after Ar Gas Cluster Ion Beam (GCIB) sputtering was investigated using X-ray photoemission spectroscopy and compared with those obtained via mono-atomic Ar ion beam sputtering. The Ar ion sputtering had a great deal of influence on the electronic structure of the oxide thin film. Ar GCIB sputtering without sample rotation also affected the electronic structure of the oxide thin film. However, Ar GCIB sputtering during sample rotation did not exhibit any significant transition of the electronic structure of the $Ta_2O_5$ thin films. Our results showed that Ar GCIB can be useful for potential applications of oxide materials with sample rotation.

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전자빔 몬테 카를로 시물레이션 프로그램 개발 및 전자현미경 이미징 특성 분석 (Development of Electron Beam Monte Carlo Simulation and Analysis of SEM Imaging Characteristics)

  • 김흥배
    • 한국정밀공학회지
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    • 제29권5호
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    • pp.554-562
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    • 2012
  • Processing of Scanning electron microscope imaging has been analyzed in both secondary electron (SE) imaging and backscattered electron (BSE) image. Because of unique characteristics of both secondary electron and backscattered electron image, mechanism of imaging process and image quality are quite different each other. For the sake of characterize imaging process, Monte Carlo simulation code have been developed. It simulates electron penetration and depth profile in certain material. In addition, secondary electron and backscattered electron generation process as well as their spatial distribution and energy characteristics can be simulated. Geometries that has fundamental feature have been imaged using the developed Monte Carlo code. Two, SE and BSE images generation process will be discussed. BSE imaging process can be readily used to discriminate in both material and geometry by simply changing position and direction of BSE detector. The developed MC code could be useful to design BSE detector and their position. Furthermore, surface reconstruction technique is possibly developed at the further research efforts. Basics of Monte Carlo simulation method will be discussed as well as characteristics of SE and BSE images.

충남 내포지방의 한옥 공소에 나타난 민간 기술자의 현장기법 (Craftsmanship of Non-Educated Constructors in Korean-Style Secondary Station(Gong-So) of Naepo Region)

  • 박광현;김태영
    • 한국농촌건축학회논문집
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    • 제12권3호
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    • pp.19-26
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    • 2010
  • This study is aimed to look into the craftsmanship non-educated constructors in Korean-style secondary stations(Gong-So) of Naepo region which is located in the northwestern Chungcheongnam-do. Although the area was persecuted as one of three cradles of Korean Catholicism, Catholic activities flourished there. The 13 cases of Korean-style secondary stations were selected through a survey report list about modern cultural assets of Chungcheongnam-do published in december 2004. This study examined the methods of plan layout and framework of Gong-So to look into craftsmanship of non-educated constructors, the results are as follows; The methods of plan layout are divided into three types according to existence and arrangement of inner column(Nae-Ju); 'Layout with Nae-Ju' is considered as the primary form of Korean-style Gong-So with using regular Nae-Ju. 'Layout with the different position of the center between Nae-Ju and exterior column(Oe-Ju)' and 'layout without Nae-Ju' is appeared in Korean-style Gong-So which is important to assembly and alter function. The methods of framework are appeared variously according to different plan layout for securing worship space. The unusal beam(Chung-Ryang) is used to solve different spans of altar and narthex. When space was formed widely without Nae-Ju, diagonal members and M letter type rafters are used, they are influenced by the technique of western wooden roof truss.