• Title/Summary/Keyword: scanning electron microscopy (SEM) scale

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Effect of polymer substrates on nano scale hot embossing (나노 사이즈 hot embossing 공정시 폴리머의 영향)

  • Lee, Jin-Hyung;Kim, Yang-sun;Park, Jin-goo
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.71-71
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    • 2003
  • Hot embossing has been widely accepted as an alternative to photolithography in generating patterns on polymeric substrates. The optimization of embossing process should be accomplished based on polymer substrate materials. In this paper, the effect of polymer substrates on nano scale hot embossing process was studied. Silicon molds with nano size patterns were fabricated by e-beam direct writing. Molds were coated with self-assembled monolayer (SAM) of (1, 1, 2.2H -perfluorooctyl)-trichlorosilane to reduce the stiction between mold and substrates. For an embossing, pressure of 55, 75 bur, embossing time of 5 min and temperature of above transition temperature were peformed. Polymethylmethacrylates (PMMA) with different molecular weights of 450,000 and 950,000, MR-I 8010 polymer (Micro Resist Technology) and polyaliphatic imide copolymer were applied for hot embossing process development in nano size. These polymers were spun coated on the Si wafer with the thickness between 150 and 200 nm. The nano size patterns obtained after hot embossing were observed and compared based on the polymer properties by scanning electron microscopy (SEM). The imprinting uniformity dependent on the Pattern density and size was investigated. Four polymers have been evaluated for the nanoimprint By optimizing the process parameters, the four polymers lead to uniform imprint and good pattern profiles. A reduction in the friction for smooth surfaces during demoulding is possible by polymer selection.

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The Scanning Electron Microscopic study on the effect during subgingival calculus removal using Nd:YAG laser (치은연하치석제거술시 Nd : YAG 레이저를 이용한 효과에 관한 주사전자현미경적 연구)

  • Jeon, Yong-Seon;Choi, Byung-Son;Lee, Seok-Cho;Kim, Hyung-Seop
    • Journal of Periodontal and Implant Science
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    • v.27 no.2
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    • pp.411-424
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    • 1997
  • The purpose of this study was to evaluate in vitro the effects during subgingival calculus removal using Nd:YAG laser. The study group was consisted of 30 teeth with advanced periodontal disease extracted before the start of periodontal therapy. The specimens were divided into 8 different groups : 1) untreated control 2) scaling and root planing only 3) laser treated using 150mJ/pulse, 1sec, 5sec, contact mode 4) laser treated using 200mJ/pulse, 5sec, contact mode 5) laser treated using 150mJ/pulse, 1sec, non-contact mode 6) laser treated using 200mJ/pulse, 5sec, non-contact mode 7) laser treated using l5OmJ/pulse, 1sec, contact mode with water irrigation 8) laser treated using 200mJ/pulse, 5sec, contact mode with water irrigation. All specimens were prepared for evaluation by scanning electron microscopy(SEM). Specimens from Group 2 exhibited a smear layer of scale like texture with parallel instrument tracks resulting from curet use. Specimens treated by contact mode, Group 3 and 4 featured surface changes not observed· in controls such as charring, randomly distributed pitting and crater formation, and melting down of the tooth material and calculus. Specimens treated by noncontact mode, Group 5 and 6 featured similar surface changes observed in contact mode. However, the differences between contact and non-contact groups not significant. Specimens treated by contact mode with water irrigation, Group 7 and 8 featured slight surface change compared to other groups. The results suggested that Nd: YAG laser did not completely remove the subgingival calculus but was possible the application as adjunctive method.

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Newly recorded species of the genus Synura (Synurophyceae) from Korea

  • Jo, Bok Yeon;Kim, Han Soon
    • Journal of Ecology and Environment
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    • v.41 no.1
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    • pp.9-18
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    • 2017
  • Background: Species in the heterokont genus Synura are colonial and have silica scales whose ultrastructural characteristics are used for classification. We examined the ultrastructure of silica scales and molecular data (nuclear SSU rDNA and LSU rDNA, and plastid rbcL sequences) to better understand the taxonomy and phylogeny within the section Petersenianae of genus Synura. In addition, we report the first finding of newly recorded Synura species from Korea. Results: We identified all species by examination of scale ultrastructure using scanning and transmission electron microscopy (SEM and TEM). Three newly recorded species from Korea, Synura americana, Synura conopea, and Synura truttae were described based on morphological characters, such as cell size, scale shape, scale size, keel shape, number of struts, distance between struts, degree of interconnections between struts, size of base plate pores, keel pores, base plate hole, and posterior rim. The scales of the newly recorded species, which belong to the section Petersenianae, have a well-developed keel and a characteristic number of struts on the base plate. We performed molecular phylogenetic analyses based on sequence data from three genes in 32 strains (including three outgroup species). The results provided strong statistical support that the section Petersenianae was monophyletic, and that all taxa within this section had well-developed keels and a defined number of struts on the base plate. Conclusions: The phylogenetic tree based on sequence data of three genes was congruent with the data on scale ultrastructure. The resulting phylogenetic tree strongly supported the existence of the section Petersenianae. In addition, we propose newly recorded Synura species from Korea based on phylogenetic analyses and morphological characters: S. americana, S. conopea, and S. truttae.

An Experimental Study on Slagging/Fouling Characteristics for Various Coals in a 50kWth Pulverized Coal Combustion System (50kWth미분탄 연소 시스템에서 탄종별 슬래깅 및 파울링 특성 연구)

  • Kang, Kieseop;Lee, Jaewook;Chae, Taeyoung;Ryu, Changkook;Yang, Won
    • 한국연소학회:학술대회논문집
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    • 2012.11a
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    • pp.107-109
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    • 2012
  • In Korean coal power plants, rising coal prices have recently led to the rapid utilization of low lank coals such as sub-bituminous coal with low calorific values and low ash fusion temperatures. Using these coals beyond the design range has resulted in important issues including slagging and fouling, which cause negative effects in boiler performances and unstable operations. The purpose of this study is to observe slagging and fouling characteristics resulted from burning various ranks of pulverized coals. We have tested 3 different coals: FLAME(bituminous), KCH(sub-bituminous) and MOOLARBEN(bituminous)coals in the pilot system $50kW_{th}$ scale. A stainless steel tube with preheated air inside was installed in the downstream in order to simulate water wall. Collected ash on the probe and the slag inside the furnace near burner were analyzed by SEM (scanning electron microscopy) to verify the formation degree, surface features and color changes of the pasty ash particles. Induced coupled plasma and energy dispersive X-ray spectroscopy were also performed to figure out the chemical characteristics of collected samples. As a result, KCH was observed that more slag was developed inside the walls of the furnace and on the probe than the other two kinds of coals, as shown in the calculate slagging and fouling indices as well.

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A Study for Stable End Point Detection in 90 nm WSix/poly-Si Stack-down Gate Etching Process (90 nm급 텅스텐 폴리사이드 게이트 식각공정에서 식각종말점의 안정화에 관한 연구)

  • Ko, Yong-Deuk;Chun, Hui-Gon;Lee, Jing-Hyuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.3
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    • pp.206-211
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    • 2005
  • The device makers want to make higher density chips on the wafer through scale-down. The change of WSix/poly-Si gate film thickness is one of the key issues under 100 nm device structure. As a new device etching process is applied, end point detection(EPD) time delay was occurred in DPS+ poly chamber of Applied Materials. This is a barrier of device shrink because EPD time delay made physical damage on the surface of gate oxide. To investigate the EPD time delay, the experimental test combined with OES(Optical Emission Spectroscopy) and SEM(Scanning Electron Microscopy) was performed using patterned wafers. As a result, a EPD delay time is reduced by a new chamber seasoning and a new wavelength line through plasma scan. Applying a new wavelength of 252 nm makes it successful to call corrected EPD in WSix/poly-Si stack-down gate etching in the DPS+ poly chamber for the current and next generation devices.

Fabrication of Hydrophobic Surface by Controlling Micro/Nano Structures Using Ion Beam Method (이온빔을 이용한 표면 미세구조 제어를 통한 발수 표면 제조)

  • Kim, Dong-Hyeon;Lee, Dong-Hoon
    • Corrosion Science and Technology
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    • v.17 no.3
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    • pp.123-128
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    • 2018
  • The fabrication of a controlled surface is of great interest because it can be applied to various engineering facilities due to the various properties of the surface, such as self-cleaning, anti-bio-fouling, anti-icing, anti-corrosion, and anti-sticking. Controlled surfaces with micro/nano structures were fabricated using an ion beam focused onto a polypropylene (PP) surface with a fluoridation process. We developed a facile method of fabricating hydrophobic surfaces through ion beam treatment with argon and oxygen ions. The fabrication of low surface energy materials can replace the current expensive and complex manufacturing process. The contact angles (CAs) of the sample surface were $106^{\circ}$ and $108^{\circ}$ degrees using argon and oxygen ions, respectively. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FT-IR) spectroscopy were used to determine the chemical composition of the surface. The morphology change of the surfaces was observed by scanning electron microscopy (SEM). The change of the surface morphology using the ion beam was shown to be very effective and provide enhanced optical properties. It is therefore expected that the prepared surface with wear and corrosion resistance might have a considerable potential in large scale industrial applications.

Prediction of Etch Profile Uniformity Using Wavelet and Neural Network

  • Park, Won-Sun;Lim, Myo-Taeg;Kim, Byungwhan
    • International Journal of Control, Automation, and Systems
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    • v.2 no.2
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    • pp.256-262
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    • 2004
  • Conventionally, profile non-uniformity has been characterized by relying on approximated profile with angle or anisotropy. In this study, a new non-uniformity model for etch profile is presented by applying a discrete wavelet to the image obtained from a scanning electron microscopy (SEM). Prediction models for wavelet-transformed data are then constructed using a back-propagation neural network. The proposed method was applied to the data collected from the etching of tungsten material. Additionally, 7 experiments were conducted to obtain test data. Model performance was evaluated in terms of the average prediction accuracy (APA) and the best prediction accuracy (BPA). To take into account randomness in initial weights, two hundred models were generated for a given set of training factors. Behaviors of the APA and BPA were investigated as a function of training factors, including training tolerance, hidden neuron, initial weight distribution, and two slopes for bipolar sig-moid and linear function. For all variations in training factors, the APA was not consistent with the BPA. The prediction accuracy was optimized using three approaches, the best model based approach, the average model based approach and the combined model based approach. Despite the largest APA of the first approach, its BPA was smallest compared to the other two approaches.

Inductively coupled plasma etching of SnO2 as a new absorber material for EUVL binary mask

  • Lee, Su-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.124-124
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    • 2010
  • Currently, extreme ultraviolet lithography (EUVL) is being investigated for next generation lithography. EUVL is one of competitive lithographic technologies for sub-22nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance due to the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore, new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

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Frequency effect of TEOS oxide layer in dual-frequency capacitively coupled CH2F2/C4F8/O2/Ar plasma

  • Lee, J.H.;Kwon, B.S.;Lee, N.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.284-284
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    • 2011
  • Recently, the increasing degree of device integration in the fabrication of Si semiconductor devices, etching processes of nano-scale materials and high aspect-ratio (HAR) structures become more important. Due to this reason, etch selectivity control during etching of HAR contact holes and trenches is very important. In this study, The etch selectivity and etch rate of TEOS oxide layer using ACL (amorphous carbon layer) mask are investigated various process parameters in CH2F2/C4F8/O2/Ar plasma during etching TEOS oxide layer using ArF/BARC/SiOx/ACL multilevel resist (MLR) structures. The deformation and etch characteristics of TEOS oxide layer using ACL hard mask was investigated in a dual-frequency superimposed capacitively coupled plasma (DFS-CCP) etcher by different fHF/ fLF combinations by varying the CH2F2/ C4F8 gas flow ratio plasmas. The etch characteristics were measured by on scanning electron microscopy (SEM) And X-ray photoelectron spectroscopy (XPS) analyses and Fourier transform infrared spectroscopy (FT-IR). A process window for very high selective etching of TEOS oxide using ACL mask could be determined by controlling the process parameters and in turn degree of polymerization. Mechanisms for high etch selectivity will discussed in detail.

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Spectral Analysis of $CO_2$ Corrosion Product Scales on 13Cr Tubing Steel

  • Lin, Guan-fa;Xu, Xun-yuan;Bai, Zhen-quan;Feng, Yao-rong
    • Corrosion Science and Technology
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    • v.7 no.4
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    • pp.201-207
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    • 2008
  • $CO_2$ corrosion product scales formed on 13 Cr tubing steel in autoclave and in the simulated corrosion environment of oil field are investigated in the paper. The surface and cross-section profiles of the scales were observed by scanning electron microscopy (SEM), the chemical compositions of the scales were analyzed using energy dispersion analyzer of X-ray (EDAX), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) to confirm the corrosion mechanism of the 13 Cr steel in the simulated $CO_2$ corrosion environment. The results show that the corrosion scales are formed by the way of fashion corrosion, consist mainly of four elements, i.e. Fe, Cr, C and O, and with a double-layer structure, in which the surface layer is constituted of bulky and incompact crystals of $FeCO_3$, and the inner layer is composed of compact fine $FeCO_3$ crystals and amorphous $Cr(OH)_3$. Because of the characteristics of compactness and ionic permeating selectivity of the inner layer of the corrosion product scales, 13 Cr steel is more resistant in $CO_2$ corrosion environment.